CFN Endstations at NSLS

CFN Contributing User Programs at the National Synchrotron Light Source (NSLS)

In January 2007, the CFN will begin two Contributing User Programs. The first program involves small-angle x-ray scattering (SAXS) and grazing-incidence small-angle x-ray scattering (GISAXS) measurements on NSLS beamline X6B, while the second program involves combined low-energy electron microscopy and synchrotron-based photoelectron microscopy (LEEM-PEEM) measurements on NSLS beamline U5UA. Proposals for beam time to carry out nanoscience measurements on these beamlines are submitted through the NSLS on-line Proposal, Allocation, Safety, and Scheduling (PASS) system. The NSLS Proposal Review Panels rate nanoscience beam time proposals, which are then considered for NSLS General User beam time. If the proposal PI is a registered CFN User, then the proposal is also eligible for CFN Contributing User beam time, which amounts to 25% of the available beam time. Highest rated proposals are given priority in allocating beam time. A description of the endstation instrumentation associated with the SAXS/GISAXS and LEEM-PEEM Contributing User Programs follow.

For general information on the CFN Contributing User Programs at the NSLS contact: Ron Pindak (631-344-7529)

1. SAXS/GISAXS CFN Contributing User Program

Beamline X6B operates at x-ray energies from 6.5 to 19 keV for scattering and diffraction. Beam focus (Rh-coated bent toroid mirror, downstream of Si(111) double-crystal monochromator, 10 m from sample position) is < 0.3 mm vertical, < 0.4 mm horizontal. A four-circle Huber goniometer with Euler cradle and analyzer circles supports a range of sample holders including powder capillaries, thin films or wafers, or small environmental chambers on a motorized z-stage. In-hutch beam path has vacuum paths, beam shutter, beam attenuators covering dynamic range 1015 at 19 keV, two ion chambers, and several sets of slits and pinholes which can be configured to suit different experiments. We are presently equipped with a Bicron scintillator detector, a Ge(111) analyzer crystal, and a 165 mm CCD area detector which can be placed from 0.8 to 1.5 m from the sample. Measurement capabilities include high resolution powder diffraction (delta two-theta=0.00267degrees), x-ray reflectivity, SAXS (Qmin=0.03), and grazing-incidence wide- and small-angle scattering from organic and nanoparticle films. Resonant scattering from nanoparticles, time-resolved powder diffraction while temperature cycling, in-situ reflectivity in a water-filled chamber, and position-resolved SAXS experiments have been performed by users in the past year.

Contact: Elaine DiMasi (631-344-2211)

2. LEEM-PEEM CFN Contributing User Program

The undulator beamline U5UA hosts a commercial low-energy electron microscope (LEEM III, manufactured by Elmitec) equipped with an electron energy analyzer so that it can also be used as a photoemission electron microscope (PEEM) operating in ultra-high vacuum (UHV). The sample is illuminated either by an electron beam or by monochromatic focused soft x-ray radiation with tunable photon energy (15-150 eV) and a vertical beam size of 30-50 microns. Modes of operation include mirror electron microscopy (MEM), bright-field and dark-field low-energy electron microscopy (LEEM), low-energy electron diffraction (LEED), x-ray photoelectron spectroscopy (XPS), and x-ray photoelectron emission microscopy (XPEEM). In XPEEM pilot experiments, a lateral resolution better than 80 nm with a photoelectron energy resolution of about 0.3 eV has been achieved. For LEEM (lateral resolution 10-20 nm) and LEED, samples must be crystalline (single-crystals are preferred) and conducting (metal or semiconductor). The sample holder allows heating by electron bombardment or can be cooled by LN2, enabling sample temperatures between 200 K and about 1800 K. Current research topics include epitaxial growth of metal and semiconductor nanostructures, and surface chemistry/catalysis on metals and metal oxides under UHV conditions. For in-situ MBE growth experiments in the microscope chamber, up to two evaporators (2.75” outer flange diameter, Omicron style) as provided by the user may be installed.

Contact: Peter Sutter (631-344-3109)

Synchrotron Techniques for Characterization of Nanoscience Systems

In addition to the synchrotron characterization techniques available through the CFN Contributing User programs, there are a number of nanoscience characterization techniques available on NSLS Facility Beamlines. Proposals for beam time to use these synchrotron characterization techniques should be submitted through the NSLS PASS system. Below is a table listing the available techniques, their associated beamlines and local contacts.

Technique Beamline Local Contact
Angle-resolved
Ultraviolet photoelectron spectroscopy (UPS), spin-resolved
U5UA Elio Vescovo
Infrared microspectroscopy U10B Randy Smith
Infrared transmission and reflection spectrospcopy U12IR Randy Smith
X-ray scattering, resonant
Magnetic circular dichroism
X13A Cecilia Sanchez Hanke
Microdiffraction Imaging X13B Kenneth Evans-Lutterodt
X-ray absorption spectroscopy
X-ray absorption spectroscopy, extended fine structure, near edge, and near edge fine structure
X18B Syed Khalid
X-ray scattering, resonant
X-ray absorption spectroscopy
X-ray absorption spectroscopy, extended fine structure, near edge, and near edge fine structure
X19A Syed Khalid
X-ray diffraction, single crystal
X-ray scattering, magnetic
X-ray scattering, resonant
X-ray scattering, small angle
X21 Christie Nelson
X-ray microprobe X27A James Ablett

 

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Last Modified: May 6, 2008
Please forward all questions about this site to: Stephen Giordano.