X21 External Homepage
Beamline X21
General Information
Source Type Insertion Device Status Operational General User Beamtime 50% Energy Range Category Hard X-Ray (1-50 keV) Energy Range 5-15 keV
Beamline Type Facility Beamline Technique(s) X-ray diffraction, single crystal X-ray scattering, magnetic X-ray scattering, resonant X-ray scattering, small angle
Institution(s) Boston University NSLS University of Vermont
Research Types SAXS, In-situ Materials Processing, X-ray Scattering in a Magnetic Field, X-ray Scattering
Contact Information
Spokesperson ![The person from each beamline who acts as a contact point between the beamline management and NSLS administration. Contact for questions about the beamline scientific program, experimental capabilities, and beamline management.](https://webarchive.library.unt.edu/eot2008/20080916100509im_/http://www.nsls.bnl.gov/images/icons/definition_sm.gif)
Christie Nelson, Brookhaven National Laboratory, csnelson@bnl.gov, 344-4916 Lin Yang, Brookhaven National Laboratory, lyang@bnl.gov, 344-5833
Local Contact ![The beamline staff member who is typically responsible for overseeing the daily operation and maintenance of the beamline. Contact for questions about beamline instrumentation, experimental details, and training.](https://webarchive.library.unt.edu/eot2008/20080916100509im_/http://www.nsls.bnl.gov/images/icons/definition_sm.gif)
Christie Nelson, Brookhaven National Laboratory, csnelson@bnl.gov, 344-4916 Lin Yang, Brookhaven National Laboratory, lyang@bnl.gov, 344-5833
Beamtime Scheduler ![The beamline staff member responsible for coordination of beamline schedule every trimester. Contact for questions about beamtime scheduling.](https://webarchive.library.unt.edu/eot2008/20080916100509im_/http://www.nsls.bnl.gov/images/icons/definition_sm.gif)
Christie Nelson, Brookhaven National Laboratory, csnelson@bnl.gov, 344-4916
Beamline Phone
631-344-5721
Instrumentation
Beamline Characteristics
Energy Range |
Mono Crystal or Grating |
Resolution (ΔE/E) |
Flux |
Spot Size (mm) |
Total Angular Acceptance (mrad) |
5 – 20 keV |
interchangable Si(111) and multilayer |
10-4 for Si(111), ~ 10-2 for multilayer |
2 x 1012 ph/sec (@ 300mA, w/o slits) |
0.5H x 0.5V in upstream hutch; defined by slits for SAXS |
1 |
Source Type Hybrid wiggler, 13 periods, 12 cm period Optical System This beamline has two experimental hutches. The upstream hutch is intended for scattering experiments that utilize the 13T superconducting magnet, or a 4-circle Huber diffractometer. The downstream hutch is intended for small angle scattering and in-situ film growth experiments. Experimental Apparatus Upstream hutch: 13 T superconducting magnet, with vertical field, mounted on a spectrometer table in a horizontal scattering geometry; 4-circle Huber diffractometer; displex cryostat
Downstream hutch: 3 precision slits, in vacuum attenuator and beam monitor, x-z-tilt stage for sample mount, evacuated beam path, 13 cm Mar CCD detector, spectrometer table for in-situ film growth. Computer System Hardware & Software EPICS based control system, SPEC.
Links
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