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Laser Power and Energy Calibrations

 The Optoelectronics Division currently provides calibration services for meters used with the lasers, wavelengths, and power ranges shown in the following table. Other laser wavelengths, power, and energy levels are available upon request as Special Tests. Please contact Marla Dowell for additional information.

LASER POWER AND ENERGY METERS
	Description	Wavelength	Range	Documentation	Contact
Optical Fiber Power	Absolute Power Calibration	670, 780, 850, 980, 1310, 1480, 1550, and 1625 nm	10 - 100 mW	SP250-54	Igor Vayshenker
		980 nm	0.1 - 200 mW
	Optical Fiber Power Meter Linearity	850, 980, 1300, 1480, and 1550 nm	-90 to 0 dBm	SP250-56
		980 and 1480 nm	0 to 30 dBm
	Spectral Responsivity of Laser and Optical Fiber Power Meters	400 - 1700 nm	10 - 100 mW	SP250-53	Josh Hadler
CW	HeCd laser	325 nm	1 µW - 10 mW	SP250-75	Josh Hadler
	Argon laser	351 and 364 nm	1 µW - 1 W
		488 nm	1 µW - 6 W
		514 nm	1 µW - 10 W
	HeNe laser	633 nm	1 µW - 20 mW
	Diode laser	830 nm	1 µW - 20 mW
	Nd:YAG laser	532 nm	1 µW - 2 W
		1064 nm	1 µW - 800 W (6 kW off-site)
		1319 nm	1 µW - 25 mW
	Erbium laser	1550 nm	1 µW - 100 mW
	Ti:Sapphire laser	700 - 950 nm	1 nW - 1 W
	CO2 laser	10.6 µm	1 W to 1.5 kW (6 kW off-site)	NIST 2004	Xiaoyu Li
	Dye laser	Contact Josh Hadler for details.
	High Accuracy Laser Measurments	375 to 1700 nm	0.1 - 1 mW	SP250-62	David Livigni
Pulsed	Q-Switched Nd:YAG laser	1.06 µm	1 - 300 mJ/pulse energy 1 mW to 6 W average power 1 - 20 Hz laser repetition rate		Xiaoyu Li
	Low Level Nd:YAG laser	1.06 µm	10-4 - 10-8 W (peak power) 10-11 - 10-15 J/pulse energy 10 Hz to 300 kHz laser repetition rate	SP250-64	Rod Leonhardt
	KrF excimer laser	248 nm	5 µJ/Pulse - 250 mJ/pulse energy 50 µW - 7 W average 1 - 200 Hz laser repetition rate	ULSI 1998	Chris Cromer
	ArF excimer laser	193 nm	5 µJ/Pulse - 5 mJ/pulse energy 10 µW - 3 W average power 1 - 400 Hz laser repetition rate	ULSI 2000
	F2 excimer laser	157 nm	1 µJ/Pulse - 1 mJ/Pulse eneryg 10 µW - 1 W average power 1 - 200 Hz laser repetition rate	Microlithography 2002