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https://www.nist.gov/nanotechnology
Nanotechnology
Advancing nanoscale measurement science, standards, and nanotechnology is an important component of NIST's mission to promote U.S. innovation and industrial competitiveness. From leading cutting edge research to coordinating the development of standards that promote trade, NIST's programs in nanotechnology directly impact priorities important to the nation's economy and well being.
No approved vaccine exists for RSV, a life-threatening virus that attacks the respiratory system. State-of-the-art neutron and X-ray scattering performed at the
In a step toward making more accurate and uniform 3D-printed parts such as personalized prosthetics and dental materials, researchers at the National Institute
Liquids aren’t as well behaved in space as they are on Earth. Inside a spacecraft, microgravity allows liquids to freely slosh and float about. This behavior
A new design for light-emitting diodes (LEDs) developed by a team including scientists at the National Institute of Standards and Technology (NIST) may hold the
Accurate production of nanoscale features on semiconductor chips is essential to their performance, but typical design tools cater to the dominance of straight
Manufacturers of magnetic data storage are continually developing higher density devices to meet the demand for faster, longer-lasting and lower-energy IT
Conventional techniques for analyzing chemical composition, such as infrared (IR) microscopy often miss critically important nanoscale details. To overcome this
This project focuses on understanding the potential for nanoscale engineered materials to advance state-of-the-art spectroscopic techniques and foster the
To fabricate and measure solid state implementations of manufacturable atomically precise devices. Build the infrastructure to fabricate prototype few-atom
Many computational programs exist that are being used by industry for predicting properties of polymer composites, but their general predictive power is limited
Y. Ramaye, V. Kestens, J. Charoud-Got, S. Mazoua, G. Auclair, Tae Joon Cho, Blaza Toman, Vincent A. Hackley, T. Linsinger
This report describes the production of SRM 1993/ERM-FD306, silica particles suspended in a borate buffer, certified for electrophoretic mobility and zeta
Y. Ramaye, V. Kestens, J. Charoud-Got, S. Mazoua, G. Auclair, Tae Joon Cho, Blaza Toman, Vincent A. Hackley, T. Linsinger
This report describes the production of SRM 1992/ERM-FD305, silica particles suspended in a borate buffer, certified for electrophoretic mobility and zeta
Tae Joon Cho, Justin M. Gorham, John M. Pettibone, Jingyu Liu, Jiaojie Tan, Vincent A. Hackley
Despite the breadth and quality of published work in this area, it remains unclear how the specific properties of polyethyleneimine (PEI) and the methods
Pengcheng Huo, Maowen Song, Wenqi Zhu, Cheng Zhang, Lu Chen, Henri J. Lezec, Yanqing Lu, Amit K. Agrawal, Ting Xu
We design and experimentally demonstrate a TiO2 metasurface that enables full-color generation and ultrasmooth color brightness variations. The reproduced
The Nanolithography Toolbox is a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and
An electron hologram is a fringe modulated image containing the amplitude and phase information of an electron transparent object. The HolograFREE routines
This technology package, a.k.a process design kit (PDK), defines the NIST superconducting optoelectronics process: OLMAC. It is in the klayout format of
MOSAIC is a modular single-molecule analysis toolbox to decode multi-state single-molecule and nanopore time-series data. Read the documentation for additional
The Semitool PSC-101 spin rinse dryer uses deionized water to rinse and heated nitrogen to dry whole wafer substrates automatically after wet chemical processes
The Reynolds Tech silicon etch wet bench uses dilute potassium hydroxide (KOH) to preferentially etch silicon along the material's crystal planes. The process
The Reynolds Tech silicon nitride etch wet bench uses dilute phosphoric acid to preferentially etch silicon nitride on silicon. The process is used to define
The Reynolds RCA wet bench is used to remove organic and metal contamination from the surfaces of substrates prior to high temperature furnace processing. The