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Nanoscale Metrology Group

Welcome

The Nanoscale Metrology Group (683.03) in the Semiconductor & Dimensional Metrology Division (683) of the Physical Measurement Laboratory (PML) at the National Institute of Standards and Technology (NIST), realizes and disseminates the SI unit of length and conducts research and development in length metrology and length measurement instruments and provides industrially-important, length-related measurements, standards, and measurement and data-analysis practices in support of trade and U.S. manufacturing products and processes. Measurements are made that are traceable to the definition of the meter for pitch and for feature dimension (e.g., line width), where features of interest extend down to nanometer size, and are measured, for example, by tunneling, atomic-force, electron, and visible- and ultraviolet-light microscopies. Special emphasis is placed on satisfaction of the advanced needs of U.S. microelectronic manufacturing industries and the emerging nanomanufacturing and nanotechnology industries.

Nanoscale Metrology

Programs/Projects

Photomask Dimensional Metrology—Measurement of linewidth or critical dimension (CD) continues to be one of the most fundamental dimensional metrology needs in the semiconductor and nanomanufacturing industries.  The …

Wafer Level SEM Metrology for Critical Dimension Measurements—In the semiconductor manufacturing industry, microscopes are used to measure feature linewidths of a few tens of nanometers for process monitoring and control At this scale, the largest component …

Scanning Particle-Beam Microscope Innovations—The work at the Scanning Particle-Beam Microscope Project is aimed at the development of the best-in-the-world scanning electron and ion microscopy and related dimensional metrology. This includes …

Optical Linescale Metrology—The cornerstone of traceability for the SI Unit of length, the meter, is the Linescale Interferometer (LSI) which provides World-class one-dimensional scale calibrations traceable to the SI as …

Nanoparticle Manipulation Metrology—The Nanoparticle Manipulation Metrology Project will develop an optical tweezers system for the trapping and manipulation of nanoparticles.

Atomic Force Microscope (AFM) Nanoparticle Metrology—The largest existing market for nanotechnology centers on production and use of nanoparticles and nanocomposites. The NextGen Program is developing techniques for fixing soft, bio-mimetic …

Highlights
  • Through-focus Scanning Optical Microscope
    A novel technique under development at the National Institute of Standards and Technology (NIST) uses a relatively inexpensive optical microscope to quickly and cheaply analyze nanoscale …
 
Contact

Physical Measurement Laboratory (PML)
Semiconductor & Dimensional Metrology Division

Nanoscale Metrology Group (683.03)
Dr. John A. Kramar, Leader

General Information:
Regenia M. McCloud, Secretary
301-975-3488 Telephone
301-869-0822 Facsimile

100 Bureau Drive, M/S 8212
Gaithersburg, Maryland 20899-8212