The NanoFab has a new capability to enhance its prototype and proof-of-concept capabilities with a Heidelberg DWL-66FS Laser Pattern Generator designed for low volume mask making and direct writing. It is designed to write directly 1x1 to 6x6 inch square masks, with structures down to 0.6 micrometer linewidth. The Heidelberg is also capable of direct patterning on substrates up to 150mm in diameter. The tool accepts a wide variety of standard design files formats such as DXF, GDS-II, CIF, Gerber, STL formats.
The NanoFab has a new capability to enhance its prototype and proof-of-concept capabilities with a Heidelberg DWL-66FS Laser Pattern Generator designed for low volume mask making and direct writing. It is designed to write directly 1x1 to 6x6 inch square masks, with structures down to 0.6 micrometer linewidth. The Heidelberg is also capable of direct patterning on substrates up to 150mm in diameter. The tool accepts a wide variety of standard design files formats such as DXF, GDS-II, CIF, Gerber, STL formats.