Center for Nanoscale Science & Technolgy home page NIST home page CNST NanoFab home page Equipment Listing User Information page Manuals and Forms page Safety Information page User Forum site Staff News and Announcements
RestrictedThis page is for NIST Staff only!
• Table Top SEM
• Scanning Electron Microscope
• Transmission Electron Microscope

NIST CNST NanoFab Equipment
Imaging/Analysis

Certain commercial equipment, and software, are identified in this documentation to describe the subject adequately. Such identification does not imply recommendation or endorsement by the NIST, nor does it imply that the equipment identified is necessarily the best available for the purpose.


Bridges gap between high power optical scope and standard SEM. Ease of use, depth of focus, auto image adjustment and speed (3 min. set-up time)

  • Mag: 20-10,000x
  • Accel. voltage: 15kV
  • Max sample size: 70mm
  • Max sample thick: 20mm
  • Traverse: 15x18mm
  • Measurement markers
Applications:
  • Direct observation of non-conductive samples
  • Stereoscopic observation of surface topography
  • Contrast imaging based on sample atomic number differences
Demonstrated use: MEMs imaging; Inspection of lithography results

Table-top SEM
 

High performance research grade field emission SEM for imaging

  • Digital system with full function computer control
  • Airlock
  • Pieceparts to 150 mm wafers
  • Secondary and backscattered electron detectors
  • Images structures down to 10 nm in size
  • Resolution: 1.5 nm at 15 keV
  • Magnification: 10x to 1000kx
Applications:
  • Measurement and inspection of nanometer level structures
  • Can accommodate substrates from small pieces to 150 mm wafers
Demonstrated use: Nanolithography inspection, MEMs, Etch cross-sections

Zeiss Ultra-60 FESEM
 

The FEI TitanTM 80-300 S/TEM is an advanced field emission scanning/transmission electron microscope capable of atomic-level imaging and analysis of a wide range of materials and nanostructures. The tool can take specimens that are ≤ 3 mm in size and thinned to electron transparency.

  • TEM mode, STEM mode, electron diffraction mode
  • Variable acceleration voltage: 80-300kV (currently aligned for 80kV, 200kV, 300kV)
  • Information Limit: 0.10 nm
  • Point Resolution: 0.20 nm @ 300kV
  • STEM resolution: 0.136 nm @ 300kV
  • Gatan Orius digital camera (2kx2k)
  • Fischione high angle annular dark field STEM detector for Z-contrast imaging
  • Gatan GIF Quantum energy filter for EELS and EFTEM (chemical analysis)
  • EDAX energy-dispersive x-ray spectrometer
  • Tomography acquisition, reconstruction, and analysis software
  • Analytical, heating, cooling, and tomography specimen holders
Applications:
  • Near atomic-level imaging of nanomaterials
  • Nanoscale chemical and elemental analysis of nanomaterials, semiconductors, interfaces
  • Imaging and analysis of biomaterials
  • 3-dimensional imaging
Demonstrated use: Carbon nanotubes, graphene, nanoparticles, solar cells, semiconductors, DNA
Titan Tem
 


Go to top of page

The National Institute of Standards and Technology (NIST) is an agency of the U.S. Department of Commerce.

Privacy policy / security notice / accessibility statement / Disclaimer / Freedom of Information Act (FOIA) /
Environmental Policy Statement / No Fear Act Policy / ExpectMore.gov (performance of federal programs) /
NIST Information Quality Standards / Scientific Integrity Summary


Online: February 2012
Last Updated: February 2012

Website Comments:cnstwebmaster@nist.gov