![](https://webarchive.library.unt.edu/web/20121010132613im_/http://www.nsf.gov/images/x.gif) News From the Field New Method Monitors Semiconductor Etching as It Happens--With Light
![](https://webarchive.library.unt.edu/web/20121010132613im_/http://www.nsf.gov/images/greenlineshort.jpg)
September 28, 2012
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University of Illinois researchers have a new low-cost method to carve delicate features onto semiconductor wafers using light--and watch as it happens. The technique can monitor a semiconductor's surface as it is etched, in real time, with nanometer resolution. This allows the researchers to create complex patterns quickly and easily, and adjust them as needed.
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Source University of Illinois at Urbana-Champaign
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