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Thin Film and Nanostructure Processing Group

Welcome
daniel josell

Daniel Josell,
Group Leader

The Thin Film and Nanostructure Processing Group is one of four groups that comprise the Material Measurement Laboratory’s Metallurgy Division. The Group studies the processing and characterization of materials at dimensions where internal and external interfaces substantially impact their properties, with the intent of advancing measurement science, standards, and technology needed by U.S. industry.

Group Competence

Deposition of thin films
Electrodeposition of metals and alloys
Evaporation of thin films and alloys
Growth of nanowires and creation of devices
• Gallium-nitride and wide bandgap nanowires
• Silicon and germanium nanowires
Measurements for evaluation of hydrogen in materials
Development of microscopy methods
Measurements of stress in thin films
Standard Reference Materials

Programs/Projects

Microscopy Methods—This project is developing means of quantitatively measuring chemical distributions in three dimensions at the nanometer scale in materials with complex heterogeneities. The 3D chemical imaging and …

Measurements for Hydrogen Storage Materials—The goal of this project is to develop the metrology necessary for rapid, high-throughput measurement of the hydrogen content of novel materials proposed for hydrogen storage. A focus is bringing …

Semiconductor Nanowire Metrology: Electronics, Photonics, and Sensors—In this project, we are developing metrology needed for the synthesis, processing, and characterization of semiconductor nanowire structures to enable reliable nanoscale device development for …

Nanostructure Fabrication Processes—In this project we are developing in situ measurements relevant to the electrochemical fabrication, processing, and application of nanostructured materials and devices. Our effort is focused on the …

Selected Publications