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Summary:
Description:
HP-ICP-OES was developed at NIST approximately a decade ago as a means of performing high-accuracy, low-uncertainty chemical analyses. HP-ICP-OES incorporates a robust experimental design, a unique drift correction procedure, a judiciously chosen internal standard, and gravimetric sample handling. It has become one of the main methodologies used at NIST for value assignment of SRMs that are certified for elemental content, including the SRM 3100 series single-element standard solutions. When HP-ICP-OES was first developed, it was assumed that the plasma would be sufficiently immune to matrix effects and small variations in analyte and internal standard element mass fractions to obviate any need for exact matching of standards to samples. Careful but less than exact matching was thought to be adequate. However, experience has shown that this is not necessarily the case. For many analytes, HP-ICP-OES precision and accuracy can be improved through exact matching. Additional Technical Details:
Major Accomplishments:
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End Date:OngoingLead Organizational Unit:mmlStaff:Therese A. Butler Related Programs and Projects:Fundamental Chemical Metrology Associated Products:Contact
Michael R. Winchester Gregory C. Turk
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