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Summary:Graphene, a two-dimensional sheet of carbon, is considered one of the materials most likely to produce the next breakthrough in the electronics revolution. Ideal graphene has the highest electron mobility of any material, giving rise to high electron and thermal conductivities, both of which are important in the next generation of highly efficient electronic devices. Actual devices never achieve the ideal properties of graphene due to the interactions between the graphene and the other parts of the devices, like the substrate and the contacts. If graphene is going to be an important part of the next revolution in information processing, it is necessary to fabricate it as cheaply and as well as silicon. Understanding the consequences of the interaction of graphene with its environment and the consequences of different growth techniques is crucial to developing graphene into an important material. Description:When many graphene layers are stacked on top of each other, the result is graphite. When just a two layers are stacked, the result is referred to as “bilayer graphene” and when there are just a few layers, “few layer graphene.” While single-layer graphene has been studied more than these other forms, the other forms have some potential advantages for applications. One advantage is that some of the growth techniques that are most likely to scale up to device production naturally produce few layer graphene. In addition, it is possible in few layer graphene to create a band gap (one of the important features of a semiconductor for electronic devices) by applying an electric field perpendicular to the layers. We have carried out a number of calculations to understand the transport properties of bilayer and few layer graphene.
Selected Publications
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Electronic coupling between individual atoms in the top and bottom layers of a twisted graphene bilayer. Lead Organizational Unit:cnstCustomers/Contributors/Collaborators:Staff:
Mark D. Stiles - NIST
Shaffique Adam - NIST Hongki Min - NIST/UMD (now at Seoul National University) Joseph Stroscio - NIST Nikolai Zhitenev - NIST Young Jae Song - NIST/UMD (now at Samsung) Suyong Jung - NIST/UMD Contact
Mark D. Stiles, Phone 301-975-3745 NIST |