NIST Standard Reference Database 134 | |
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NIST Standard Reference Database 134 | |
The 1999
Semiconductor Industry Association (SIA) International Technology
Roadmap for Semiconductors (ITRS) identifies "Equipment Modeling"
as first in a list of "Technology Requirements" and states that
"the drivers for equipment modeling are equipment design, process
control, . . . " The ITRS indicates that continuing research is
needed to obtain experimental data for "transport and thermal
constants." This Project will generate transport and
thermodynamic property data for the gases used in semiconductor
processing. The data will be useful for equipment modeling in
chemical vapor deposition (CVD) processes and the data will also
provide a rational basis for the calibration of mass flow
controllers (MFCs) used to meter process gases. NIST is measuring the thermophysical properties of the process gases, the "surrogate" gases, and binary mixtures of process and carrier gases. The process gases are used in CVD and the surrogate gases are used to calibrate MFCs. The results will be disseminated in this data base providing the heat capacity, thermal conductivity, viscosity, and the virial coefficients for the virial equation of state providing the pressure-density-temperature relation for the process gases. |
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For Questions or Comments
contact: John Hurly |
Keith Gillis NIST Mail Stop 8360 Gaithersburg, MD 20899-8360 Phone: 301-975-2468 |
Last modified: 3 July 2007
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