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Journal Publications Details for:

Dry Lithography: Environmentally Responsible Processes for High Resolution Pattern Transfer and Elimination of Image Collapse using Positive Tone Resists
Grant Number R829586
RFA: Technology for a Sustainable Environment (2001)

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  • Journal Article (9)
    • Reference Type Citation Progress Report Year Document Sources
    Journal Article Boggiano MK, DeSimone J. Alicyclic photoresists for CO2-based microlithography at 157 nm. Abstracts of Papers of the American Chemical Society 2002;224(PMSE Pt 2):149 R829586 (Final)
    		 not available
    Journal Article Boggiano MK, DeSimone JM. Alicyclic photoresists for CO2-based microlithography at 157 nm. Polymeric Materials Science and Engineering 2002;87:207-208. R829586 (Final)
    		 not available
    Journal Article Boggiano MK, DeSimone JM. Photoresists for CO2-based next-generation microlithography. Abstracts of Papers of the American Chemical Society 2005;229(PMSE Pt 2):83 R829586 (Final)
    		 not available
    Journal Article Boggiano MK, DeSimone JM. Photoresists for CO2-based next-generation microlithography. Polymeric Materials Science and Engineering 2005;92:140-141. R829586 (Final)
    		 not available
    Journal Article Denison GM, Jones III C, DeYoung J, Gross S, et al. The use of 'dry' CO2-based technologies for the enhanced fabrication of microelectronic devices. Polymeric Materials Science and Engineering 2004;90:152-153. R829586 (Final)
    		 not available
    Journal Article Denison GM, Jones CA, DeYoung J, Gross SM, McClain J, Zannoni LA, Hicks E, Wood CD, Boggiano MK, Visintin PM, Bessel CA, Schauer CK, DeSimone JM. Use of 'dry' CO2-based technologies for the enhanced fabrication of microelectronic devices. Abstracts of Papers of the American Chemical Society 2004;227(PMSE Pt 2):89 R829586 (Final)
    		 not available
    Journal Article Maynor BW, Rolland JP, Exner AE, DeSimone JM. Rational fabrication of polymeric nanostructures using soft lithography. Polymer Preprints 2005;46:82 (abstract). R829586 (Final)
    		 not available
    Journal Article Wood CD, DeSimone JM. New fluoropolymers for next generation photolithographic techniques. Polymeric Materials Science and Engineering 2005;92:133. R829586 (Final)
    		 not available
    Journal Article Zannoni LA, DeSimone JM. Synthesis, characterization, and properties of copolymers prepared in dense carbon dioxide towards the development of a 157 nm Photoresist. Polymeric Materials Science and Engineering 2002;87:197-198. R829586 (2002)
    		 not available

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