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Removal of Photoresist and Post-Plasma Etch Sidewall Films Using Superciritical and Subcritical CO2 with Additives

EPA Grant Number: R829554
Title: Removal of Photoresist and Post-Plasma Etch Sidewall Films Using Superciritical and Subcritical CO2 with Additives
Investigators: Hess, Dennis W.
Current Investigators: Hess, Dennis W. , Levitin, Galit , Myneni, Satya
Institution: Georgia Institute of Technology
EPA Project Officer: Savage, Nora
Project Period: January 1, 2002 through December 31, 2004
Project Amount: $325,000
RFA: Technology for a Sustainable Environment (2001)
Research Category: Pollution Prevention/Sustainable Development

Description:

The overall objective of this research is to investigate the use of environmentally benign approaches for the removal of organic films and residues generated during the fabrication of integrated circuits (ICs) and microelectronic devices.

Approach:

The work will focus on the use of supercritical and subcritical carbon dioxide for film and residue removal; appropriate additives and co-solvents to carbon dioxide will be identified and the necessary fluid conditions established. Novel elevated pressure reactors, designed to investigate removal processes based upon carbon dioxide mixtures, will allow detailed information on the interaction of fluids with films/residues. Knowledge of these interactions will be used to establish specific fluid mixtures that permit a more environmentally benign approach to effective organic film and residue removal in IC fabrication.

Expected Results:

Results of these studies will allow the design of organic film and residue processes that will minimize the current use of both hazardous chemicals and extensive quantities of de-ionized water.

Publications and Presentations:

Publications have been submitted on this project: View all 15 publications for this project

Journal Articles:

Journal Articles have been submitted on this project: View all 7 journal articles for this project

Supplemental Keywords:

electronics, environmentally conscious manufacturing, engineering. , Sustainable Industry/Business, Scientific Discipline, RFA, Technology for Sustainable Environment, Sustainable Environment, Chemical Engineering, Chemistry, cleaner production/pollution prevention, Environmental Chemistry, New/Innovative technologies, Engineering, supercritical carbon dioxide, waste reduction, co-solvents, electronics , waste minimization, environmentally conscious manufacturing, subcritical CO2, environmentally friendly technology, integrated circuit fabrication, organic films, environmentally conscious design, supercritical carbon dioxide (SCCO2) technology, organic residues

Progress and Final Reports:
2002 Progress Report
2003 Progress Report
Final Report

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The perspectives, information and conclusions conveyed in research project abstracts, progress reports, final reports, journal abstracts and journal publications convey the viewpoints of the principal investigator and may not represent the views and policies of ORD and EPA. Conclusions drawn by the principal investigators have not been reviewed by the Agency.

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