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(September 2006)
Figure 7-6: Astron Remote Plasma Source for Reducing PFC Emissions from Semiconductor Manufacturing
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Updated 20 January 2007
U.S. Climate Change Technology Program Strategic Plan
September 2006
Figure 7-6. Astron Remote Plasma Source for Reducing PFC Emissions from Semiconductor Manufacturing
Astron Remote Plasma Source (for NF3 CVD chamber cleaning) , an important technology for reducing PFC emissions from semiconductor manufacturing.
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