Project Title:
Free-Space Particulate Contamination Sizing and Counting System for Space Applications
08.11-3888A
Free-Space Particulate Contamination Sizing and
Counting System for Space Applications
SKW Corp.
1901 North Moore Street, #1204
Arlington, VA 22209
Scott J. Bartel (703-243-3888)
GSFC -- NAS5-30290
Abstract:
Spaceborne particles from either man-made or natural sources can cause undesirable
effects on spaceborne optical systems and micro-gravity manufacturing systems requiring
a "clean" vacuum. A system capable of making multiple, particle size and count measurements
in free space would be an asset for establishing the particulate contamination on
the STS Orbiter, the Space Station, and other spaceborne systems.
The innovation explored in this project, a particle imaging measuring system (PIMS),
will provide real-time engineering data regarding the size and frequency distribution
of particulate contaminants in the micro-gravity and vacuum environment of space.
The PIMS requires the following elements to perform this function: an illumination
source, a solid-state imager, and image processing hardware and software. The technique
investigated used a gated xenon strobe, macro-optical systems, a solid-state video
imager, and signal processing electronics to correlate backscatter with known particle
sizes. Additional work indicates that far better size correlation will be achieved
by using a scanned laser as an illumination source. What makes this approach interesting
is that it would be a relatively compact, low-cost instrument capable of continuous
monitoring of the particulate environment.
Phase I efforts successfully demonstrated the imager and image processing elements
by measuring back scatter from a test target. Phase I also revealed test and illumination
techniques which lead to the solutions proposed for possible future efforts.
Potential Commercial Application:
Potential Commercial Application: The instrument described in this abstract has the
potential to become a standard feature for space-borne optical and manufacturing
systems where absolute knowledge of the contamination environment is required.