Project Title:

Curved Channel MCP Improvement Program

08.04-9191E
Project Title:Curved Channel MCP Improvement Program
Company:Galileo Electro-Optics Corp.
Sturbridge, MA 01518
Principal Investigator:LaPrade, Bruce N.

Abstract:

Curved Channel Microchannel Plates (C2 MCP) have been proposed for use in a number
of Scientific and Astronomical Applications.  This single stage high gain, high spacial
resolution device is an ideal detector for space flight applications.  The performance
of the curved channel plate can be significantly enhanced through the elimination
of two major mechanical shortcomings.

The first area to be addressed is theuniformity of channel curvature.  Non-uniformity
of channel curvature can cause gain variations, localized photocathode degradation
caused by poor ion trapping, non-uniform pulse height distribution and dynamic range
limitations.  Currently, many systems rely on a pre-launch calibration to "normalize"
the gain of the array.

The work effort on channel curvature non-uniformity will center around developing
a thorough understanding of the mechanics and thermodynamics of channel bending through
an intensive computer modeling of the process coupled with process and product anlysis.

A second area to be addressed is the area of blemishes.  Blemishes are small voids
in the glass structure which can cause dead areas or "hot spots" in the imaging area.

This work effort will center around a materials analysis of the blemished material
utilizing Auger or EDAX.