The Center for High-rate Nanomanufacturing is developing tools and processes to enable high-rate/high-volume bottom-up, precise, assembly of nanoelements (such as carbon nanotubes, nanoparticles, etc.) and polymer nanostructures. The center’s nanotemplates are utilized to conduct fast massive directed assembly of nanoelements by controlling the forces required to assemble, detach, and transfer nanoelements over large areas. The developed technology will accelerate the creation of highly anticipated commercial products and will enable the creation of an entirely new generation of applications in electronics, energy, material, bio/medical areas.
6th International Surface Cleaning Workshop
November 3-4, 2008
Northeastern University
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6th New England International Nanomanufacturing Workshop
September 11-12, 2008
Northeastern University
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Small Times Highlights CHN Research
"Center for High-rate Nanomanufacturing's "revolutionary" technology for nanoscale assembly."
NSF Center for Nano and Micro-contamination Control
5th International Surface Cleaning Workshop
Proceedings Now Available
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The 5th New England International Nanomanufacturing Workshop Proceedings now available
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Ahmed Busnaina Participates in Semiconductor International Webcast on "Nanotechnology's Role in Post-CMOS Production"
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Alumni Magazine Feature Article on Nanotechnology - "All Things Great . . . Are Small"
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CHN Director Ahmed Busnaina edits new publication "Nanomanufacturing Handbook""
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June 19 - 20, 2007:
The 5th New England International Nanomanufacturing Workshop.
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June 27 - 29, 2007:
1st International Conference on Nanomanufacturing and Directed Self-Assembly Processes, Seoul, Korea
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Copyright © 2007 - 2008
Northeastern University
NSF Center for High-rate Nanomanufacturing
467 Egan Center
120 Forsyth Street
Boston, MA 02115
(617) 373-6012
NSF Center for Nano and Micro-contamination Control
The George J. Kostas Nanoscale Technology and Manufacturing Research Center at Northeastern University
This work was supported by the National Science Foundation (Award # NSF-0425826)
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