Licensable Technologies : Materials : Nanotechnology

Substrate Heater for Thin Film Deposition

Abstract
A substrate heater for thin film deposition of metallic oxides upon a target substrate configured as a disk including means for supporting in a predetermined location a target substrate configured as a disk, means for rotating the target substrate within the support means, means for heating the target substrate within the support means, the heating means about the support means and including a pair of heating elements with one heater element situated on each side of the predetermined location for the target substrate, with one heater element defining an opening through which desired coating material can enter for thin film deposition and with the heating means including an opening slot through which the target substrate can be entered into the support means, and, optionally a means for thermal shielding of the heating means from surrounding environment is disclosed.

IP Status: Available both Exclusively and Non Exclusively

Reference Number: 540

S Number: DOE reference no.(s): 75,023

Patents & Applications:
United States National Patent Number 5554224 Issued on 09/10/1996

Posted: 09-01-2005

Contact
John Russell
Technology Transfer Division
Los Alamos National Laboratory
P.O. Box 1663, MailStop C334
(505) 665-3941
jrussell@lanl.gov