Licensable Technologies : Materials : Sensors

Superconducting Microcircuitry by the Microlithographic Patterning of Superconducting Compounds and Related Materials

Abstract
Superconducting microcircuits including a thin layer of Ba.sub.2 Cu.sub.3 O.sub.5+x (0<x<1) on a substrate. A thin layer of a dopant; for example, Y.sub.2 O.sub.3 for superconducting patterns of YBa.sub.2 Cu.sub.3 O.sub.7-x, or Pr.sub.2 O.sub.3 for insulator patterns of PrBa.sub.2 Cu.sub.3 O.sub.7-x. These layers are covered with a layer of photoresist, which is exposed to light through a mask having a pattern for a desired circuit. The photoresist is then developed to reveal a pattern of the thin dopant layer which will be etched away. The microcircuit is then etched and stripped to remove the unneeded portion of the thin dopant layer. Finally, the microcircuit is heated at a temperature and for a period of time sufficient to diffuse and react the dopant layer with the thin layer of Ba.sub.2 Cu.sub.3 O.sub.5+x, forming a pattern of superconductor or insulator.

IP Status: Available both Exclusively and Non Exclusively

Reference Number: 534

S Number: DOE reference no.(s): 72,851

Patents & Applications:
United States National Patent Number 5238913 Issued on 08/24/1993

Posted: 10-01-2004

Contact
John Russell
Technology Transfer Division
Los Alamos National Laboratory
P.O. Box 1663, MailStop C334
(505) 665-3941
jrussell@lanl.gov