Licensable Technologies : Materials : Nanotechnology

Aligned-Crystalline Silicon Film on Glass

Abstract
Los Alamos National Laboratory (LANL) has demonstrated the growth of Aligned-Crystalline Silicon (ACSi) films on glass. This invention is related to other inventions when LANL demonstrated Aligned Crystalline Silicon on flexible metal tape, both on insulating substrates and on conductive substrates. By modifying the process and using a special type of glass, LANL has deposited thin film layers via IBAD (Ion Beam Assisted Deposition) and buffer layers to allow extremely well aligned biaxially-oriented silicon to be deposited. The advanced ACSi film technology enables low-cost, high-performance Si-based device development on glass. First applications are likely to be in the areas of solar cells and thin film transistor (TFT) flat panel displays.

Application(s)
• Photovoltaics
• Solar Cells
• Electronic displays
• Thin Film Transistors (TFT)
• Flat Panel Displays (FPD)
• Other Electronics

Advantages
• Lower cost thin-films
• Higher quality crystalline layers
• High-yield solar capture

IP Status: Available both Exclusively and Non Exclusively

Commercialization Strategy: We are seeking to license this technology either non-exclusively or exclusively for specific field of use. We would also entertain offers to work collaboratively in the form of Cooperative Research & Development Agreements (CRADA). Any agreement contract is expected to include funds-in to the Laboratory.

Reference Number: 772

S Number: DOE reference no.(s): 109,105

Patents & Applications:
Application(s) Pending

Posted: 07-27-2006

Contact
John Mott
Technology Transfer Division
Los Alamos National Laboratory
P.O. Box 1663, MailStop C334
(505) 665-0883
jmott@lanl.gov