Licensable Technologies : Materials : Nanotechnology

Method For Producing Fluorinated Diamond-Like Carbon Films

Abstract
This invention consists of Fluorinated, diamond-like carbon (F-DLC) films produced by a pulsed, glow-discharge plasma immersion ion processing procedure. The pulsed, glow-discharge plasma was generated at a pressure of 1 Pa from an acetylene (C.sub.2 H.sub.2) and hexafluoroethane (C.sub.2 F.sub.6) gas mixture, and the fluorinated, diamond-like carbon films were deposited on silicon <100>substrates. The film hardness and wear resistance were found to be strongly dependent on the fluorine content incorporated into the coatings. The hardness of the F-DLC films was found to decrease considerably when the fluorine content in the coatings reached about 20%. The contact angle of water on the F-DLC coatings was found to increase with increasing film fluorine content and to saturate at a level characteristic of polytetrafluoroethylene.

Application(s)
Diamond-Like Carbon Hardness Applications

IP Status: Available both Exclusively and Non Exclusively

Reference Number: 112

S Number: DOE reference no.(s): 91,784; 97,724

Patents & Applications:
United States National Patent Number 6572937 Issued on 06/03/2003

Posted: 09-17-2004

Contact
John Russell
Technology Transfer Division
Los Alamos National Laboratory
P.O. Box 1663, MailStop C334
(505) 665-3941
jrussell@lanl.gov