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| Choose format: | Standard | Full tag view |
| Title |
 Photomask technology 2008 : 7-10 October 2008, Monterey, California, USA /
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| Author |
Kawahira, Hiroichi. Zurbrick, Larry S.
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| Physical Descr. | 2 v. : digital, PDF file. |
| Series |
( Proceedings of SPIE--the International Society for Optical Engineering l v. 7122.)
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| Note | Some earlier conferences have the title: Symposium on Photomask Technology, or the title: Annual BACUS Symposium on Photomask Technology, or the title: BACUS Symposium on Photomask Technology. |
| Bibliography | Includes bibliographical references. |
| Additional Form | Available online to subscribers via SPIE Digital Library at http://www.spiedl.org |
| Subject |
Integrated circuits -- Masks -- Congresses.
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Microlithography -- Congresses.
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| Other Author |
Society of Photo-optical Instrumentation Engineers
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SPIE Digital Library
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| Conference |
Symposium on Photomask Technology
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BACUS Symposium on Photomask Technology
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| Other Title | Photomask technology |
| ISBN | 9780819473554 |
| 0819473553 | |
| Format | Conference |
| Book | |
| Electronic Book | |
| Online resource | |
| Record Number | 001342740 |
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| ONLINE ACCESS: | http://link.spie.org/PSISDG/7122/1 |
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