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Title	Photomask and next-generation lithography mask technology XV : 16-18 April 2008, Yokohama, Japan /
Author	Horiuchi, Toshiyuki.
Physical Descr.	2 v. :  digital, PDF file.
Series	( Proceedings of SPIE--the International Society for Optical Engineering v. 7028.)
Note	Some earlier proceedings have title: Photomask and X-ray mask technology.
Bibliography	Includes bibliographical references.
Additional Form	Available online to subscribers via SPIE Digital Library at http://www.spiedl.org
Subject	Masks (Electronics) -- Congresses.
	Integrated circuits -- Masks -- Congresses.
	X-ray lithography -- Congresses.
	Microlithography -- Congresses.
	Optoelectronic devices -- Design and construction -- Congresses.
Other Author	Photomask Japan.
	BACUS (Technical group)
	Society of Photo-optical Instrumentation Engineers
	SPIE Digital Library
Other Title	Photomask and next-generation lithography mask technology
Add.Title	Photomask and X-ray mask technology
ISBN	9780819472434
	0819472433
Format	Book
	Electronic Book
	Online resource
Record Number	001342703
ONLINE ACCESS:	http://link.spie.org/PSISDG/7028/1

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