| Title Information | |
Title | Papers from the First International Workshop on Plasma-Based Ion Implantation : |
Subtitle | 4-6 August 1993, University of Wisconsin--Madison, Madison, Wisconsin / |
| Name:conference | |
Name Part | International Workshop on Plasma-Based Ion Implantation 1993 : University of Wisconsin--Madison) |
Role | |
Role Term:Text | creator |
| Name:Personal | |
Name Part | Conrad, John R |
| Name:Personal | |
Name Part | Sridharan, Kumar |
| Name:Corporate | |
Name Part | Applied Science and Technology (ASTeX), Inc |
| Type of Resource | text |
| Genre (MARCGT) | bibliography |
| Genre (MARCGT) | conference publication |
| Origin Information | |
Place | |
Place Term:Code (MARC Country Code) | nyu |
Place | |
Place Term:Text | New York |
Publisher | Published for the American Vacuum Society by the American Institute of Physics |
Date Issued | 1994 |
Issuance | monographic |
| Language | |
Language Term:Code (ISO 639-2B) | eng |
| Physical Description | |
Form (marcform) | |
Extent | p. 813-998 : ill. ; 30 cm. |
| Note:Statement of Responsibility | sponsored by Applied Science and Technology (ASTeX), Inc. ... [et al.] ; editors for the workshop, John R. Conrad, Kumar Sridharan. |
| Note | "Published in both 1994 March/April issue of the Journal of vacuum science and technology B, vol. 12, no. 2"--T.p. verso. |
| Note | Includes bibliographical references and index. |
| Subject (LCSH) | |
Topic | Ion implantation |
Topic | Congresses |
| Classification (LCC) | TS695.25 .I57 1993 |
| Classification (DDCEdition 21) | 621.3815/2 |
| Related Item:Host | |
Title Information | |
Title | Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena. |
Part Number | 2nd ser., v. 12, no. 2 |
| Record Information | |
Record Content Source | DLC |
Record Creation Date (encoding="marc") | 940504 |
Record Change Date (encoding="iso8601") | 19970618142736.9 |
Record Identifier | 4968605 |