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Publications Details for:
Removal of Photoresist and Post-Plasma Etch Sidewall Films Using Superciritical and Subcritical CO2 with Additives
Grant Number R829554
RFA: Technology for a Sustainable Environment (2001)
| Reference Type | Citation | Progress Report Year | Document Sources |
|---|---|---|---|
| Book Chapter | Myneni S, Hess DW, Mendicino L. Fluorocarbon film and residue removal using supercrital CO2 mixtures.. The Electrochemical Scoiety, Pennington, NJ. 2002:180-189 |
R829554 (2002) |
not available |
| Journal Article | Levitin G, Myneni S, Hess DW. Reactions between CO2 and tetramethylammonium hydroxide in cleaning solutions. Electrochemical and Solid State Letters 2003;6(8):G101-G104. |
R829554 (2002) R829554 (2003) |
not available |
| Journal Article | Levitin G, Bush D, Eckert CA, Hess DW. Phase behavior and modeling of CO2/methanol/tetramethylammonium bicarbonate and O2/methanol/tetramethylammonium bicarbonate/water mixtures at high pressures. Journal of Chemical Engineering & Data 2004;49(3):599-606. |
R829554 (2003) |
not available |
| Journal Article | Levitin G, Myneni S, Hess DW. Post plasma etch residue removal using CO2-TMAHCO(3) mixtures: Comparison of single-phase and two-phase mixtures. Journal of the Electrochemical Society 2004;151(6):G380-G386 |
R829554 (2002) R829554 (2003) R829554 (Final) |
not available |
| Journal Article | Levitin G, Hess DW. Ionic conductivity of elevated pressure TMAHCO(3)/MeOH/CO2 mixtures. Electrochemical and Solid State Letters 2005;8(1):G23-G26 |
R829554 (Final) |
not available |
| Journal Article | Myneni S, Hess DW. Post-plasma-etch residue removal using CO2-based fluids. Journal of the Electrochemical Society 2003;150(12):G744-G750 |
R829554 (Final) |
not available |
| Journal Article | Myneni S, Peng H-G, Gidley DW, Hess DW. Compatibility of High Pressure Cleaning Mixtures with a Porous Low Dielectric Constant Film: A positronium Annihilation Lifetime Spectroscopic Study. Journal of Vacuum Science and Technology B 2005;.23(4): 1463. |
R829554 (Final) |
not available |
| Journal Article | Petkov MP, Weber MH, Lynn KG, Rodbell KP. Porosity characterization by beam-based three-photon positron annihilation spectroscopy. Applied Physics Letters 2001;79(23):3884-3886 |
R829554 (Final) |
not available |
| Patent/Patent Application | Satoh H, Fukui M, Kawakami C, Chlorine Engineers CorpLtdTokyo JP. Method for regenerating tetraalkylammonium hydroxide. 1994/10/11/;08/168,277 Filed: December 15, 1993(5,354,434):9694-9700 |
R829554 (Final) |
not available |
| Presentation | Hess DW, Levitin G, Myneni S. Carbon dioxide based fluids for post plasma etch residue removal in integrated circuit (IC) fabrication. Presented at the Seventh Annual Green Chemistry and Engineering Conference, Washington, DC, June 23-26, 2003. |
R829554 (Final) |
not available |
| Presentation | Levitin G, Myneni S, Hess DW. Impact of phase behavior on photoresist removal using CO2 based mixtures. Presented at the Eighth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 204th Meeting of The Electrochemical Society, Orlando, FL, October 12-16, 2003. |
R829554 (Final) |
not available |
| Presentation | Levitin G, Myneni S, Hess DW. Super- and sub-critical CO2-based cleaning in BEOL processing: correlations between physical properties of cleaning mixtures and removal mechanism. Presented at the SEMATECH Cleaning Workshop, Austin, TX, May 7, 2004. |
R829554 (Final) |
not available |
| Presentation | Myneni S, Hess DW. Fluorocarbon film and residue removal using supercritical CO2 mixtures. Presented at the 5th International Symposium on Environmental Issues with Materials and Processes for the Electronic and Semiconductors Industries, 201st Meeting of The Electrochemical Society, Philadelphia, PA, May 12-17, 2002. |
R829554 (2002) |
not available |
| Proceedings | Levitin G, Myneni S, Hess DW. Impact of phase behavior on photoresist removal using CO2 based mixtures. In: Ruzyllo J, Hattori T, Novak R, Opila R, eds. Cleaning Technology in Semiconductor Device Manufacturing, PV 2003-26, The Electrochemical Society Proceedings Series, Orlando, FL, October 12-17, 2003. |
R829554 (2003) R829554 (Final) |
not available |
| Proceedings | Myneni S, Hess DW. Fluorocarbon film and residue removal using supercritical CO2 mixtures. Proceedings - Electrochemical Society 2002;15:180-189. |
R829554 (Final) |
not available |