Reference Type
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Citation
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Progress Report Year
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Document Sources
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Journal Article |
Boggiano MK, DeSimone J. Alicyclic photoresists for CO2-based microlithography at 157 nm. Abstracts of Papers of the American Chemical Society 2002;224(PMSE Pt 2):149 |
R829586 (Final)
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not available
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Journal Article |
Boggiano MK, DeSimone JM. Alicyclic photoresists for CO2-based microlithography at 157 nm. Polymeric Materials Science and Engineering 2002;87:207-208. |
R829586 (Final)
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not available
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Journal Article |
Boggiano MK, DeSimone JM. Photoresists for CO2-based next-generation microlithography. Abstracts of Papers of the American Chemical Society 2005;229(PMSE Pt 2):83 |
R829586 (Final)
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not available
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Journal Article |
Boggiano MK, DeSimone JM. Photoresists for CO2-based next-generation microlithography.
Polymeric Materials Science and Engineering 2005;92:140-141. |
R829586 (Final)
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not available
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Journal Article |
Denison GM, Jones III C, DeYoung J, Gross S, et al. The use of 'dry' CO2-based technologies for the enhanced fabrication of microelectronic devices. Polymeric
Materials Science and Engineering 2004;90:152-153. |
R829586 (Final)
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not available
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Journal Article |
Denison GM, Jones CA, DeYoung J, Gross SM, McClain J, Zannoni LA, Hicks E, Wood CD, Boggiano MK, Visintin PM, Bessel CA, Schauer CK, DeSimone JM. Use of 'dry' CO2-based technologies for the enhanced fabrication of microelectronic devices. Abstracts of Papers of the American Chemical Society 2004;227(PMSE Pt 2):89 |
R829586 (Final)
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not available
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Journal Article |
Maynor BW, Rolland JP, Exner AE, DeSimone JM. Rational fabrication of polymeric nanostructures using soft lithography. Polymer Preprints 2005;46:82 (abstract). |
R829586 (Final)
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not available
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Journal Article |
Wood CD, DeSimone JM. New fluoropolymers for next generation photolithographic techniques. Polymeric Materials Science and Engineering 2005;92:133. |
R829586 (Final)
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not available
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Journal Article |
Zannoni LA, DeSimone JM. Synthesis, characterization, and properties of copolymers prepared in dense carbon dioxide towards the development of a 157 nm Photoresist. Polymeric Materials Science and Engineering 2002;87:197-198. |
R829586 (2002)
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not available
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Journal Article (9)