Book and Book Chapter Publications Details for:
Removal of Photoresist and Post-Plasma Etch Sidewall Films Using Superciritical and Subcritical CO2 with Additives
Grant Number R829554
RFA: Technology for a Sustainable Environment (2001)
Reference Type | Citation | Progress Report Year | Document Sources |
---|---|---|---|
Book Chapter | Myneni S, Hess DW, Mendicino L. Fluorocarbon film and residue removal using supercrital CO2 mixtures.. The Electrochemical Scoiety, Pennington, NJ. 2002:180-189 |
R829554 (2002) |
not available |