Welcome to the

Advanced Electron Microscopy in Materials Physics Workshop

Motivation & Plans

Brookhaven National Laboratory and Hitachi High Technologies America are hosting a workshop on Advanced Electron Microscopy in Materials Physics. This two day workshop will feature presentations by internationally prominent scientists working at the frontiers of electron microscopy, both on instrumentation development and applications in materials science.

The workshop is structured to stimulate scientific exchanges and explore new capabilities. While the scientific themes of the workshop are focused on aberration corrected STEM and EELS, other advanced electron microscopy methods for application of materials physics are also incorporated.

Invited speakers include P. Batson, R. Borkowski , N. Browning, M. Haider, A. Kirkland, B. Kabius, D. Muller, S. Pennycook, H. Rose, M. Ruehle and R. Tromp.

There will be an opportunity check out the newly installed cold field emission, probe-corrected, dedicated-STEM equipped with an ultra-fast high resolution EELS, and tour the new Center for Functional Nanomaterials as well!

Workshop Registration

• Today is: Thursday, September 25, 2008
• Workshop Registration (Deadline: October 31, 2007, Registration Fee: $100.00)
  70 attendee limit, registration will be first-come first serve
• Accommodation Information

Additional GIS Registration for Non-U.S. Citizens - If you are a Non-U.S. Citizen, you must complete a Guest Registration Form in addition to the Workshop Registration. Due to a required review process which will take about three weeks, ALL Foreign National attendees must be registered and approved in the BNL Guest Information System (GIS) before they will be allowed access to the site. The link to GIS will be provided to you after you have registered for this event. If you already have a BNL ID card and an active Guest Appointment there is no need to register in the GIS System.

Last Modified: January 31, 2008

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