Laboratory List

 

Fusion Energy Division (FED)

Oak Ridge National Laboratory

 

ORNL's Fusion Energy Division (FED) conducts research in nearly all areas of magnetic fusion energy development: plasma production and heating, plasma fueling, magnetics, and plasma theory. The division's capabilities are strong and vital components of both the U.S. fusion program and the international fusion community.

FED staff members conduct experimental research on toroidal confinement of high-temperature plasmas on several large tokamaks and stellarators in the United States and other countries. Theoretical research on high-temperature plasmas uses state-of-the-art computing methods to address transport phenomena, magneto-hydro-dynamics (MHD) behavior, radio-frequency (RF) heating and current drive, and plasma edge effects. FED researchers also develop RF heating and current drive technology and high-speed, frozen-pellet fueling technology for fusion research; apply plasma technology to the needs of industrial customers; transfer technology to the private sector; and contribute to the develop-ment of advanced superconducting magnets for fusion and other applications. FED conducts a variety of R&D projects applying fusion-related technologies and expertise to other fields such as plasma processing (thin-film etch and deposition), RF and microwave materials processing, plasma propulsion, and isotope separation.

The division is organized into four technical research groups --- Experimental Plasma Physics, Plasma Theory, Plasma Technology and Applications, and Applied Superconductivity Group --- and manages and operates a diverse set of research facilities:

• Microwave Processing Lab --- Wide variety of industrial/scientific microwave and RF power sources, specialized applicators and chambers used to perform materials processing R&D, feasibility testing, and industrial process scale-up. Contact: Terry White

• Superconducting Applications Lab --- Supports the development of low- and high-temperature superconducting (LTS/HTS) systems including development, testing, and characterization of HTS power cables, transformers, and motors as well as LTS coils. Supporting systems include cyrogenic (LN and He) cooling systems, cable terminations, vacuum systems, and high-current (25,000 A), high-voltage (100 kV), and impulse (200 kV) power supplies. Contact: Mike Gouge

• Microwave Development Lab --- Low-power test and measurement facility used to support materials characterization, diagnostic development and application, systems development, high-power applicator development, antenna pattern measurement (near and far field). Contact: Tim Bigelow

• Plasma Thin Film Deposition Lab --- Inductively coupled plasma sources used for the development of chemical vapor deposition techniques. Biased and unbiased substrates, temperature-controlled substrates, optical and mass spectrometers, RF current and voltage probes, and Langmuir probes are used to monitor and characterize process plasmas during the development of new films. Contact: John Caughman

• RF Test and Calibration Lab --- Provides detailed low- and high-power characterization and calibration of RF sensors, transmission lines, matching networks, and generators using an array of diagnostic equipment including network analyzers, spectrum analyzers, RF calorimeter, IR camera and data acquisition equipment. Contact: John Caughman

• Radio Frequency Test Facility --- Large-volume magnetic mirror machine used for full-power testing of advanced RF and microwave antennas. Supported by a variety of high-power (up to 1.MW) RF sources in the 8- to 20-MHz and 40 to 80-Hz range. Magnetic fields up to 2 tesla are provided by a pair of superconducting coils. Contact: Dave Rasmussen

• Plasma Fueling Laboratories --- Supports the development of a wide spectrum of innovative technologies for fueling magnetic fusion experiments, including gas injection, frozen hydrogenic pellet fueling technology, and cryogenic liquid jets. Expertise in high-speed light gas guns, research centrifuges, interior and exterior ballistics, impact dynamics, cryogenics, vacuum science, and fast control and data acquisition methods. Experience with handling large quantities of tritium in an R&D environment. Contact: Steve Combs

• Field Emission Test Lab --- Spatially resolved measurements of electron current from field emission devices; high-vacuum, computer-controlled microprobe positioning and measurement equipment. Contact: Larry Baylor

• Plasma Thin Film Etching Lab --- 300-mm inductively coupled plasma source with variable power deposition profile control and an array of Langmuir probes to measure 2D ion current profiles. Used for process plasma stability, process control, and thin-film etching R&D. Contact: John Caughman

• Ion Source Test Stand --- Ion sources and plasma generators have been used for plasma technology R&D and applications. The test stand has the capability to form hydrogen or helium ion beams 30 keV, 10A, and delivering heat flux up to ~8 kW/cm2. Contact: Jim Tsai

• Plasma Applications Lab --- ECR source and associated vacuum equipment are used for the development and demonstration of plasma cleaning, plasma erosion and deposition techniques. Contact: Jim Tsai

More detailed information can be obtained from the contacts above, or from Gary Bell Technology & Science Applications Program Manager for FED.