Fusion Energy Division (FED)
Oak Ridge National Laboratory
ORNL's Fusion Energy Division (FED)
conducts research in nearly all areas of magnetic fusion energy
development: plasma production and heating, plasma fueling,
magnetics, and plasma theory. The division's capabilities are strong
and vital components of both the U.S. fusion program and the
international fusion community.
FED staff members conduct
experimental research on toroidal confinement of high-temperature
plasmas on several large tokamaks and stellarators in the United
States and other countries. Theoretical research on high-temperature
plasmas uses state-of-the-art computing methods to address transport
phenomena, magneto-hydro-dynamics (MHD) behavior, radio-frequency
(RF) heating and current drive, and plasma edge effects. FED
researchers also develop RF heating and current drive technology and
high-speed, frozen-pellet fueling technology for fusion research;
apply plasma technology to the needs of industrial customers;
transfer technology to the private sector; and contribute to the
develop-ment of advanced superconducting magnets for fusion and other
applications. FED conducts a variety of R&D projects applying
fusion-related technologies and expertise to other fields such as
plasma processing (thin-film etch and deposition), RF and microwave
materials processing, plasma propulsion, and isotope
separation.
The division is organized into four
technical research groups --- Experimental Plasma Physics, Plasma
Theory, Plasma Technology and Applications, and Applied
Superconductivity Group --- and manages and operates a diverse set of
research facilities:
- Microwave Processing Lab --- Wide
variety of industrial/scientific microwave and RF power sources,
specialized applicators and chambers used to perform materials
processing R&D, feasibility testing, and industrial process
scale-up. Contact: Terry White
- Superconducting Applications Lab
--- Supports the development of low- and high-temperature
superconducting (LTS/HTS) systems including development, testing,
and characterization of HTS power cables, transformers, and motors
as well as LTS coils. Supporting systems include cyrogenic (LN and
He) cooling systems, cable terminations, vacuum systems, and
high-current (25,000 A), high-voltage (100 kV), and impulse (200
kV) power supplies. Contact: Mike Gouge
- Microwave Development Lab ---
Low-power test and measurement facility used to support materials
characterization, diagnostic development and application, systems
development, high-power applicator development, antenna pattern
measurement (near and far field). Contact: Tim Bigelow
- Plasma Thin Film Deposition Lab
--- Inductively coupled plasma sources used for the development of
chemical vapor deposition techniques. Biased and unbiased
substrates, temperature-controlled substrates, optical and mass
spectrometers, RF current and voltage probes, and Langmuir probes
are used to monitor and characterize process plasmas during the
development of new films. Contact: John Caughman
- RF Test and Calibration Lab ---
Provides detailed low- and high-power characterization and
calibration of RF sensors, transmission lines, matching networks,
and generators using an array of diagnostic equipment including
network analyzers, spectrum analyzers, RF calorimeter, IR camera
and data acquisition equipment. Contact: John Caughman
- Radio Frequency Test Facility ---
Large-volume magnetic mirror machine used for full-power testing
of advanced RF and microwave antennas. Supported by a variety of
high-power (up to 1.MW) RF sources in the 8- to 20-MHz and 40 to
80-Hz range. Magnetic fields up to 2 tesla are provided by a pair
of superconducting coils. Contact: Dave Rasmussen
- Plasma Fueling Laboratories ---
Supports the development of a wide spectrum of innovative
technologies for fueling magnetic fusion experiments, including
gas injection, frozen hydrogenic pellet fueling technology, and
cryogenic liquid jets. Expertise in high-speed light gas guns,
research centrifuges, interior and exterior ballistics, impact
dynamics, cryogenics, vacuum science, and fast control and data
acquisition methods. Experience with handling large quantities of
tritium in an R&D environment. Contact: Steve
Combs
- Field Emission Test Lab ---
Spatially resolved measurements of electron current from field
emission devices; high-vacuum, computer-controlled microprobe
positioning and measurement equipment. Contact: Larry
Baylor
- Plasma Thin Film Etching Lab ---
300-mm inductively coupled plasma source with variable power
deposition profile control and an array of Langmuir probes to
measure 2D ion current profiles. Used for process plasma
stability, process control, and thin-film etching R&D.
Contact: John Caughman
- Ion Source Test Stand --- Ion
sources and plasma generators have been used for plasma technology
R&D and applications. The test stand has the capability to
form hydrogen or helium ion beams
30
keV,
10A,
and delivering heat flux up to ~8 kW/cm2. Contact: Jim
Tsai
- Plasma Applications Lab --- ECR
source and associated vacuum equipment are used for the
development and demonstration of plasma cleaning, plasma erosion
and deposition techniques. Contact: Jim Tsai
More detailed information can be
obtained from the contacts above, or from Gary Bell Technology &
Science Applications Program Manager for FED.
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