Bringing Polymer Patterns into Focus
![Eric Lin working with semiconductor wafer](ericlin.jpg)
Working
at the NIST Center for Neutron Research, chemical engineer
Eric Lin places a semiconductor wafer in the path of a focused
neutron beam. The beam is used to determine the size and shape
of polymer patterns on the silicon wafer. Twenty-eight magnesium
fluoride lenses focus the neutron beam so that the instrument
can characterize polymer structures between 100-300 nanometers
wide.
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The
graphic (left) shows the two-dimensional scattering data from
a polymer grating pattern with 150 nanometer linewidths. The
colors represent the intensity of the scattered neutrons on
the square detector. White areas represent the highest intensity
followed by red through the colors of the rainbow to black.
The bright diffraction spots to either side of the center
show that the sample is evenly spaced over a large area. The
relative brightness of the spots is related to the average
shape and roughness of the lines in the pattern.
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Date
created: 4/18/01
Page
maintained by Crissy Robinson
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