Microscope: Photoemission Electron (PEEM)
Quick Specs
- Spatial Resolution: Up to 8 nm
- Temporal Resolution: Continuous to femtosecond
- Image Modes: Still to continuous motion
- Sample Types: Metals and semiconductors
- Field of View: 150 μm to 2 μm
- Base Pressure: 8×10-11 Torr
- Sample Chamber Pressure: 5×10-10 Torr
- Sample Temperature: Liquid nitrogen to 900°C
EMSL's photo-emission electron microscope (PEEM) is capable of imaging nanoscale surface structures (∼ 8 nm) by imaging electron emission induced by ultraviolet and laser light sources. The PEEM is capable of imaging nanoscale surface structures (∼ 8 nm) by imaging electron emission induced by ultraviolet and laser light sources. The PEEM is applied to surface science studies of individual nanostructures and catalytic sites on specially designed metal, semi-conducting, and metal oxide substrates. Since these sites are of nanometer dimension, we selected the highest resolution PEEM available from the manufacturer, Elmitec. The Elmitec PEEM uses inherently low-aberration magnetic lens elements to achieve the ultrafast laser sources in the EPL to study femtosecond dynamical processes with unprecedented spatial resolution.
