Electron Microscope: Dual-Beam FIB/SEM
Quick Specs
- Focused spot size of 7 nm or smaller
- Performs FIB/SEM, EBSD, EDXS, and STEM
The FEI Helios Nanolab dual-beam focused ion beam/scanning electron microscopy (FIB/SEM) microscope combines two important high-resolution microscopy tools that jointly enable important nanoscale measurements and the unique preparation of samples and materials for other uses or analysis. This instrument will provide rapid and selected region preparation of samples for transmission electron microscopy (TEM) and other spectroscopies; three dimensional analyses of nanoscale materials and other small objects; and the capability for nanoscale lithography. Functionally, the instrument includes computer-controlled ion-beam micromachining based on a liquid-metal ion source and high-resolution SEM imaging based on a field-emission-gun (FEG) electron source. Full functionality incorporates automated sample sectioning with access to electron beam, ion beam, stage positioning (allowing patterning or lithography) and gas injector control (allowing in situ etching or material deposition [beam-induced CVD]). The instrument is configured to perform these operations either simultaneously or independently, attended or unattended, at the operator's will. Energy dispersive X-ray spectroscopy (EDXS) and electron backscattering diffractions (EBSD) systems, including all necessary hardware and software for quantitative and qualitative analysis, are incorporated to allow phase identifications based on crystallographic data obtained from EBSD and compositional data based on EDXS. In addition, the instrument allows specimens prepared by FIB micromachining to be manipulated for scanning transmission electron microscopy (STEM) imaging or fabrication purposes such as welding to a TEM sample grid without breaking the vacuum within the instrument. The samples prepared using FIB are planned to be analyzed by several surface and bulk sensitive electron, ion,S and X-ray based capabilities including Auger Electron Spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS), and TEM.
| Physical Operating Criteria | Primary Performance Parameters |
|---|---|
| Operating Vacuum Conditions Electron Gun | ≤2×10-6 Torr Field Emission Gun, energy range 0.2-30 keV 0.8nm 30 keV 1.5nm @ 1keV |
| Ion species, spot size | 2-30 KeV Ga+, focused spot 7 nm or smaller |
| Capabilities | FIB/SEM, EBSD, EDXS, STEM, cryo stage, 16-bit digital pattern generation for electron and ion beams, automated TEM lift out, platinum and carbon deposition |
| Specimen Exchange Capability | Sample introduction system, future incorporation of EMSL transfer technology, anerobic sample transfer to TEM |
| Data Acquisition/Analysis | PC-based computer workstation interface 2-D and 3-D nano-characterization |
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