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Capabilities

Mass-Selected Ion Deposition System - Electrospray Source

Quick Specs

  • Allows control of soft landing energies of 0-500 eV
  • Allows control of spot size of 5 mm to 1 mm in diameter
Figure 1: Schematic view of the apparatus for mass-selected ion deposition Full Size (gif 13kb)

The mass-selected ion deposition system is a new instrument constructed at EMSL. The apparatus, shown in Figure 1, includes a high-transmission electrospray ion source, quadrupole mass filter, bending quadrupole that deflects the ion beam and prevents neutral molecules originating in the ion source from impacting the surface, an ultrahigh vacuum (UHV) chamber for ion deposition by soft landing, and a vacuum-lock system for introducing surfaces into the UHV chamber without breaking vacuum. Its design allows us to control soft landing energies (0-500 eV) and spot sizes from around 5 mm down to 1 mm in diameter. Phosphorus screen detector is used to monitor the spot size prior to ion deposition.

Research applications include:

  1. Soft-Landing of Peptide IOns Onto Self-Assembled Monolayer Surfaces: an Overview.
  2. Reactive Landing of Peptide Ions on Self-Assembled Monolayer Surfaces: A Alternative Approach for Covalent Immobilization of Peptides on Surfaces.
  3. Design and Performance of a Novel Instrument for Soft-Landing of Biomolecular Ions on Surfaces.
  4. First Observation of Charge Reduction and Desorption Kinetics of Multiply Protonated Peptides Soft Landed onto Self-Assembled Monolayer Surfaces.
  5. Charge Retention by Peptide Ions Soft-Landed onto Self-Assembled Monolayer Surfaces.