Electron Spectrometer: XPS with laser interface
Quick Specs
- Spatial resolution of 10 μm
- Energy resolution of 0.2 eV
- Accomodates sample temperature from 77 K to 500 K
This ultrahigh vacuum machine can be applied as a routine means for analyzing the structure and chemical state of surface and near-surface constituents with a spatial resolution of 10 μm and an energy resolution of less than 0.2 eV. It is equipped with state-of-the art charge neutralization and charge balance capability, so that not only conducting and semi-conducting materials may be sampled, but wide-band gap, non-conducting materials (minerals, metal-oxides, ceramics, etc.) also may be analyzed. Special modifications include several quartz and lithium fluoride laser ports, such that unique opportunities have been created for the use of ultraviolet and vacuum ultraviolet "laser etching" in precise probing and depth profiling of intercalated impurities or contaminants within substrate samples, such as mineral deposits. Using both ultrafast and excimer lasers, three-dimensional X-ray photoelectron spectoscopy (XPS) mapping can be conducted to determine changes in the surface coverage of individual components with depth, as well as broad morphological variation in the material under study. Temperature-controlled manipulators allow the sample material to be investigated over a wide thermal range (77 K to 500 K)."
