Electron Spectrometer: XPS High Resolution (Quantum)
Quick Specs
- Focused X-ray beam of 10 μm to 200 μm
- Multi-sample automated analysis
- Optimal energy resolution of 0.45 eV
- Accomodates samples 7.5-cm thick, 100-mm diameter, and 2.5-cm wide
The Physical Electronics Instruments (PHI) Quantum 2000 X-ray photoelectron spectrometer (XPS) is a unique system that uses a focused monochromatic aluminum K X-ray beam that can be varied in size from as small as 10 μm in diameter to approximately 200 μm. The beam can be rastered over larger areas (about 0.5 mm2).
The PHI Quantum 2000 XPS features:
- A focused X-ray beam (10 μm to 200 μm)
- Beam raster capability to millimeter sizes
- Optical- (charge-coupled diode camera) and X-ray-generated electron images (scanned X-ray image-SXI) to select areas of analysis
- A special specimen holder for angle-resolved analysis (non-destructive depth profiles)
- Mapping capability
- A sputter gun (Model 11-066) for specimen cleaning and depth profiles (allows sputter rates up to approximately 50 nm/min)
- Sample rotation to allow "Zalar" rotation during sputtering
- The ability to set up multi-sample automated analysis (overnight data collection)
- A charge neutralization system that uses both low-energy ions and low-energy electrons
- Compatibility with the EMSL Sample Transfer System
- A large platen size for either "large" single or multiple samples.
Performance Specifications
Performance conditions of the PHI Quantum 2000 XPS depend on operation mode; however, the following are characteristic of the instrument:
| Beam Size: | 20μm (4 watts) measured for Ag 3d 5/2 | ||
|---|---|---|---|
| Energy Resolution | High | Medium | Low |
| 0.55 eV | 0.7 eV | 1 eV | |
| Counts per second (cps) | 15,000 cps | 40,000 cps | 70,000 cps |
The best energy resolution achieved is approximately 0.45 eV. In the high-power mode at approximately 0.8 eV resolution, a count rate for the Ag 3d 5/2 photopeak of over 106 cps can be achieved.
System Configuration and Operational Overview
Sample Preparation and Handling
This XPS is equipped to handle both the standard PHI Quantum 2000 holder and the EMSL sample platens. The standard PHI holder is approximately 3-inch × 3-inch square. Almost any vacuum-compatible sample that fits within the x-y dimensions of the holder and is less than 0.5-inch thick can be analyzed. Samples can be solid or powder, conducting or insulating.
The EMSL sample platen can hold samples up to 1 inch in diameter, although smaller samples are preferred. This holder interconnects with other parts of the EMSL Sample Transfer System and allows samples to be prepared and altered in several unique ways, including by electrochemical and liquid exposure, plasma treatment, coating deposition, optical exposure, and processing by heating and cooling.
The laboratory where the instrument is housed is equipped with a variety of ways to cut, polish, and clean samples prior to analysis or experiment. All work with this instrument must be performed in compliance with EMSL practices and permits.
PHI Quantum 2000 Scanning ESCA Microprobe
| Analyzer and Optics | |
|---|---|
| Spherical Capacitor Energy Analyzer | |
| Mean Diameter | 279.4 mm (11.0 in.) |
| Input Slit | 4 x 10 mm |
| Scan Range | 0 to 3200 eV |
| Detector | |
| Type | MultiChannel Detector |
| Number of Channels | 16 |
| Input Bias | 0 to 200 V |
| Multiplier Voltage | 500 to 2400 V |
| X-RAY GENERATION | |
| The PHI Quantum 2000 XPS is equipped with a quartz crystal monochromator and a scanning electron source that excites the aluminum anode to produce a focused X-ray beam. | |
| Monochromator | |
| Diameter of Rowland Circle | 200 mm |
| Crystals Quartz | (100) crystals on an ellipsoidal substrate |
| Electron Gun | |
| Filament material | LaB6 |
| Lenses | Electrostatic condenser, magnetic objective |
| Selection of electron beam diameter | Variable from 5 μm to 100 μm Large area 100 w, 1500 μm × 200 μm |
| ION SPUTTER GUN AND GUN CONTROL | |
| Beam Voltage | Variable, 1 kV to 5 kV |
| Maximum Beam Current | > 5 μA at 5 kV |
| Minimum Beam Diameter | 150 μm at 5 kV |
| Beam Raster Size | Center of raster pattern can be fixed at the focal point or varied about the focal point |
| Fixed Center Position | At the focal point; raster up to ± 1.5 mm in x and y. |
| Variable Center Position | Center can be varied by ± 0.7 mm about the focal point |
| Neutral Suppression | 5-degree bend between the condenser and objective lenses; electrically adjustable |
| Source Type | Argon |
| Leak Valve | Integral; computer controlled |
| Pressure (In Operation) | < 5 × 10-8 Torr in chamber, with differential pumping |
| SPECIMEN DIMENSIONS | |
| x and y | Up to 7.5-cm square or 100-mm diameter |
| z | Up to 2.5-cm thick |
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