Beamline X6B
General Information
Source Type Bending Magnet Status Operational General User Beamtime 50% Energy Range Category Hard X-Ray (1-50 keV) Energy Range 6.5-19 keV
Beamline Type Facility Beamline Technique(s) X-ray diffraction, surface X-ray diffraction, wide angle X-ray reflectivity
Institution(s) Brookhaven National Laboratory CFN NSLS
Research Types X-ray scattering, reflectivity, and diffraction from soft- and bio-materials; diffractive SAXS and GISAXS. Combinatorial materials science. Interface strucctures.
Contact Information
Spokesperson ![The person from each beamline who acts as a contact point between the beamline management and NSLS administration. Contact for questions about the beamline scientific program, experimental capabilities, and beamline management.](https://webarchive.library.unt.edu/eot2008/20080916100403im_/http://www.nsls.bnl.gov/images/icons/definition_sm.gif)
Elaine Dimasi, Brookhaven National Laboratory, dimasi@bnl.gov, 344-2211
Local Contact ![The beamline staff member who is typically responsible for overseeing the daily operation and maintenance of the beamline. Contact for questions about beamline instrumentation, experimental details, and training.](https://webarchive.library.unt.edu/eot2008/20080916100403im_/http://www.nsls.bnl.gov/images/icons/definition_sm.gif)
Elaine Dimasi, Brookhaven National Laboratory, dimasi@bnl.gov, 344-2211
Beamtime Scheduler ![The beamline staff member responsible for coordination of beamline schedule every trimester. Contact for questions about beamtime scheduling.](https://webarchive.library.unt.edu/eot2008/20080916100403im_/http://www.nsls.bnl.gov/images/icons/definition_sm.gif)
Elaine Dimasi, Brookhaven National Laboratory, dimasi@bnl.gov, 344-2211
Beamline Phone
631-344-4069
Instrumentation
Beamline Characteristics
Energy Range |
Mono Crystal or Grating |
Resolution (ΔE/E) |
Flux |
Spot Size (mm) |
Total Angular Acceptance (mrad) |
6.5 – 20 keV (focused); 6.5 - 40 (unfocused) |
Si(111) |
2.0 x 10-4 (@ 8 keV) |
unmeasured |
0.3H x 0.3V (focused); 60H x 3V (unfocused) |
3.0 |
Source Type Bending magnet Optical System Monochromator: Si (111) channel-cut located 10 m from source. Focusing Mirror: Rhodium-plated bent cylindrical Si single crystal for 1:1 focusing at sample located 11.3 m from source. Experimental Apparatus Radiation hutch. 6-circle Huber 5020 diffractometer with vertical scattering geometry. Computer-controlled table for Huber. Ion chambers, NaI detector, Princeton Instruments CCD area detector, Si strip detector (shared with X9). Two-circle analyzer stage with Ge(111) crystal analyzer. Beamstops with photodiodes for through measurement when using CCD. Computer System Hardware & Software Pentium class computer running Linux for beamline optics, Huber and table; Pentium-class computer running Windows for CCD; VME crate interface for beamline control and scaler data acquisition.
Links
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