X22A External Homepage
Beamline X22A
General Information
Source Type Bending Magnet Status Operational General User Beamtime 25% Energy Range Category Hard X-Ray (1-50 keV) Energy Range 10.7 keV (nom) and 32keV
Beamline Type Participating Research Team (PRT) Technique(s) X-ray diffraction, single crystal X-ray diffraction, surface X-ray diffraction, wide angle X-ray reflectivity X-ray scattering, surface X-ray scattering, wide angle
Institution(s) Brookhaven National Laboratory, Chemistry Brookhaven National Laboratory, CMPMSD, X-ray scattering
Research Types X-ray scattering of thin organic and biomolecular material films, multilayers, catalytic materials, electrochemical interfaces, biomineral interfaces and single crystal x-ray diffraction..
Contact Information
Spokesperson ![The person from each beamline who acts as a contact point between the beamline management and NSLS administration. Contact for questions about the beamline scientific program, experimental capabilities, and beamline management.](https://webarchive.library.unt.edu/eot2008/20080916095315im_/http://www.nsls.bnl.gov/images/icons/definition_sm.gif)
Benjamin Ocko, Brookhaven National Laboratory, ocko@bnl.gov, 344-4299
Local Contact ![The beamline staff member who is typically responsible for overseeing the daily operation and maintenance of the beamline. Contact for questions about beamline instrumentation, experimental details, and training.](https://webarchive.library.unt.edu/eot2008/20080916095315im_/http://www.nsls.bnl.gov/images/icons/definition_sm.gif)
John Hill, Brookhaven National Laboratory, hill@bnl.gov, 344-3736 Benjamin Ocko, Brookhaven National Laboratory, ocko@bnl.gov, 344-4299
Beamtime Scheduler ![The beamline staff member responsible for coordination of beamline schedule every trimester. Contact for questions about beamtime scheduling.](https://webarchive.library.unt.edu/eot2008/20080916095315im_/http://www.nsls.bnl.gov/images/icons/definition_sm.gif)
John Hill, Brookhaven National Laboratory, hill@bnl.gov, 344-3736
Beamline Phone
631-344-5622
Instrumentation
Beamline Characteristics
Energy Range |
Mono Crystal or Grating |
Resolution (ΔE/E) |
Flux |
Spot Size (mm) |
Total Angular Acceptance (mrad) |
10 keV (+- 500 eV) |
Si(111) |
~2 x 10-3 |
~1011 ph/sec |
0.2H x 0.2 V |
2.1 |
Source Type Bending magnet Optical System Mirror: Platinum-coated flat mirror focusing in the vertical. Located 7.9 meters from the source.
Monochromator: Sagitally focusing Si(111) crystal monochromator scattering in the horizontal. Located at 12.4 m from the source.
Sample Position: Located at 14.56 m from the source. Experimental Apparatus Spectrometer: Huber 6-circle, vertical scattering. Computer System Hardware & Software Computer: PC/AT Compatable, Linux OS
Beam Line Controls: VME and GPIB; SPEC control software (by Certified Scientific Software)
Links
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