Guide To NIST, July 1998
EUV OPTICS FABRICATION AND CHARACTERIZATION FACILITY
NIST has an EUV multilayer characterization facility at the Synchrotron Ultraviolet Radiation Facility storage ring. The current facility, which has been disassembled for upgrading, was designed to measure the reflectance or transmittance of EUV optics such as mirrors, filters, and gratings as a function of wavelength, angle of incidence, and position on the optic. NIST is constructing a new facility that will extend measurement capabilities to larger and more curved optics and shorter wavelength. A thin-film deposition chamber has been added to the reflectometry facility that allows measurements of films as they are being deposited. From these measurements, the optical constants of important multilayer materials can be determined free from any influence of surface contaminants. Contact: Charles Tarrio |
Inquiries or comments: Charles Tarrio Online: May 1997 - Last update: July 1998 |