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Guide To NIST, July 1998

EUV OPTICS FABRICATION AND CHARACTERIZATION FACILITY

The emerging field of high-reflectance, normal-incidence soft X-ray or extreme ultraviolet (EUV) optics has a wide range of applications. The ability to produce high-quality images at wavelengths below 40 nm has allowed construction of EUV solar telescopes with unprecedented resolution, EUV microscopes able to study living biological samples with submicron resolution, and EUV photolithographic systems that are proposed as tools for the next generation of integrated circuits.

NIST has an EUV multilayer characterization facility at the Synchrotron Ultraviolet Radiation Facility storage ring. The current facility, which has been disassembled for upgrading, was designed to measure the reflectance or transmittance of EUV optics such as mirrors, filters, and gratings as a function of wavelength, angle of incidence, and position on the optic. NIST is constructing a new facility that will extend measurement capabilities to larger and more curved optics and shorter wavelength. A thin-film deposition chamber has been added to the reflectometry facility that allows measurements of films as they are being deposited. From these measurements, the optical constants of important multilayer materials can be determined free from any influence of surface contaminants.

Contact: Charles Tarrio
Electron and Optical Physics Division
NIST: National Institute of Standards and TechnologyNIST Physics Laboratory HomeMajor Research Facilities Inquiries or comments: Charles Tarrio
Online: May 1997   -   Last update: July 1998