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Beamline 12.0

EUV optics testing and interferometry, angle- and spin-resolved photoemission (12.0.1)

Operational

See endstation tables

Source characteristics

8-cm-period undulator (U8)

Energy range

See endstation tables

Monochromator

See endstation tables

Endstations

Angle- and spin-resolved photoemission (12.0.1.1)
EUV interferometer (12.0.1.2)

EUV interferometer (12.0.1.3)

Beamline phone numbers

(510) 495-2120, (510) 495-2121

 

Endstation

Angle- and spin-resolved photoemission (12.0.1.1)

Operational

Now

Energy range

24–350 eV

Monochromator

VLS-PGM (200-, 300-, 600-, and 1200-line/mm gratings)

Calculated flux (1.9 GeV, 400 mA)

~5 x 1013 photons/s/1%BW at 134 eV

Resolving power (E/ΔE)

Grating-dependent, typically from 5,000 to 10,000

Detectors

Scienta SES 100 (angle-resolved photoemission)

Samples

Format

UHV-compatible solids

Preparation

Sample manipulator with five degrees of freedom; temperature control from 10 to 375 K

Evaporation, ion sputtering, high-temperature annealing, UHV cleave

Sample environment

UHV

Scientific applications

Angle- and spin-resolved photoemission

Local contact

Name: Alexei Fedorov
Phone: (510) 486-7521
Fax: (510) 495-2067

Spokespersons

Name: Dan Dessau
Affiliation: Univ. of Colorado at Boulder
Phone: (303) 492-1607
Fax: (303) 492-2998

 

Endstation

EUV interferometer (12.0.1.2)

Operational

Now

Energy range

60–320 eV

Monochromator

VLS-PGM

Calculated flux (1.9 GeV, 400 mA)

~5 x 1013 photons/s/1%BW at 134 eV

Resolving power (E/ΔE)

200-10,000

Detectors

GaAsP flux monitor, silicon 1024 x 1024 CCD array

Samples

Preparation

All-reflective, multilayer-coated EUV optics

Sample environment

10-7 or 10-4 Torr O2

Special notes

Interferometer stations also support different modes of high -resolution EUV pattern transfer capabilities

Scientific applications

Interferometric wavefront measurement of optics designed for EUV lithography

Local contacts

Name: Kenneth Goldberg
Phone: (510) 495-2261
Fax: (510) 486-4550

Name: Patrick Naulleau
Phone: (510) 486-4529
Fax: (510) 486-4550

Spokespersons

Name: Erik Anderson
Affiliation:Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-4446
Fax: (510) 486-4955

Name: David Attwood
Affiliation: EUV/LLC
Phone: (510) 486-4463
Fax: (510) 486-4955

 

Endstation

EUV interferometer (12.0.1.3)

Operational

Now

Energy range

60–320 eV

Monochromator

VLS-PGM

Calculated flux (1.9 GeV, 400 mA)

~5 x 1013 photons/s/1%BW at 134 eV

Resolving power (E/ΔE)

200-10,000

Detectors

GaAsP flux monitor, silicon 1024 x 1024 CCD array

Samples

Preparation

All-reflective, multilayer-coated EUV optics

Sample environment

10-7 or 10-4 Torr O2

Special notes

Interferometer stations also support different modes of high -resolution EUV pattern transfer capabilities

Scientific applications

Interferometric wavefront measurement of optics designed for EUV lithography

Local contacts

Name: Kenneth Goldberg
Phone: (510) 495-2261
Fax: (510) 486-4550

Name: Patrick Naulleau
Phone: (510) 486-4529
Fax: (510) 486-4550

Spokespersons

Name: Erik Anderson
Affiliation:Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-4446
Fax: (510) 486-4955

Name: David Attwood
Affiliation: EUV/LLC
Phone: (510) 486-4463
Fax: (510) 486-4955

A manual for this beamline is available as a PDF file.


 

Coherent soft x-ray science

Operational

Now

Source characteristics

Third harmonic of 8-cm-period undulator (U8)

Energy range

200–1000 eV

Monochromator

VLS-PGM, with two gratings (600 and 1200 lines/mm)

Calculated flux (1.9 GeV, 400 mA) ~4.4 x 1010 photons/s/0.1%BW at 500 eV
Resolving power (E/DE) Resolving power (E/DE) 155 to 1000

Endstations

Coherent optics (12.0.2.1)
Coherent scattering (12.0.2.2)

Detectors Detectors CCD, photodiode, scintillator
Spot size at sample (FWHM) 60 x 9.4 µm (12.0.2.1) 85 x 8 µm (12.0.2.2)
Samples
Format
Preparation
Various
Sample environment 10-6 or 10-5 Torr O2 (12.0.2.1)
Experimental techniques Two chambers: Coherent optics (12.0.2.1) Coherent scattering, correlation spectroscopy (12.0.2.2)
Scientific applications Branchlines designed for spatially coherent soft x-ray experiments
Local contacts

Name: Yanwei Liu (12.0.2.1)
Phone: (510) 486-6103
Fax: (510) 486-4550

Name: Keoki Seu (12.0.2.2)
Phone: (510) 495-2830

Spokespersons

Name: David Attwood
Affiliation: UC Berkeley
Phone: (510) 486-4463
Fax: (510) 486-4955


Name: Stephen Kevan
Affiliation: University of Oregon
Phone: (541) 346-4742
Fax: (541) 346-3422

Beamline phone numbers

(510) 495-2107

Table of all beamlines
Diagram of all beamlines