IMOS
Technology Lowers Fabrication Costs
IMOS modules are compact (typically a few millimeters on a side),
integrated optoelectronic systems comprising micro-optics, lasers,
detectors, and interfacing electronics. IMOS technology does not
consist of a single type of component. Rather, it is a new, functional
paradigm in which the fabrication, integration, and packaging of
micro-optics and electronics are all considered from the
very beginning of the design process. Furthermore, IMOS fabrication
makes use of wafer-like manufacturing techniques similar to those
used in the microelectronics industry for producing integrated circuits.
With IMOS, components are aligned and assembled at the wafer level,
allowing the production of complex, three-dimensional optical systems
on a chip. This integrated approach allows the inexpensive fabrication
of miniaturized, high-performance optoelectronic modules and subsystems.
Benefits of IMOS Devices
IMOS takes many elements (e.g., micro-optics, lasers, detectors,
and interfacing electronics) and creates an optical system that
is a single, discrete unit. These low-cost devices have broad applications,
including incorporation into bar code scanners, telecommunications
equipment, miniature sensors for the environment, medical sensors,
and precision encoders. The IMOS technology has the potential to
enter and dominate markets such as compact disk/digital versatile
disc (CD/DVD) systems, magneto-optical disk drives, and optical
tracking for floppy disks.
Strong
Parallels Exist Between IMOS and
Integrated Circuits
There are many parallels between the introduction of the integrated
circuit in 1959 and the IMOS technology that Digital Optics sought
to develop. Whereas integrated circuit technology made it possible
to "shrink" large systems of transistors into much smaller
elements, the IMOS process "shrinks" an expensive, macroscopic
optical system into an inexpensive, compact optical system. Before
the invention of the integrated circuit, the production of computers
and other electronic systems involved slow hand-assembly of discrete
components and resulted in low yields. In the optoelectronic industry,
laborious assembly of individual components with high failure rates
has been the norm. The development of semiconductor manufacturing
techniques allowed for the efficient production of high-quality
integrated circuits; some of these same manufacturing techniques
can be used
to manufacture less expensive, high-quality
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![](images/digitaloptics.gif)
With
IMOS, components are aligned and assembled at the wafer level,
allowing the production of complex, three-dimensional optical
systems on a chip. |
integrated
micro-optical systems. Automated design, layout, and production
tools for integrated circuits are now commonplace (Digital Optics
proposed to develop analogous design, layout, and production tools
for photonics).
Digital Optics Identifies High-Risk Optical
Integration Opportunity
The marketplace and the investors considered Digital Optics' IMOS
technology too risky and cutting edge to support a significant investment.
Therefore, the company turned to ATP's Focused Program for Photonics
Manufacturing for R&D support for this innovative technology.
The ATP funding would serve as a catalyst for U.S. industrial investment
into IMOS technology by overcoming the basic
technological
hurdles and by accelerating the development of a sufficient prototyping
and manufacturing foundation from which future applied projects
would be viable. Macroeconomic benefits could then be realized from
products based on the technology, to include a decrease in labor
outsourcing and the potential to revolutionize the optical industry
with smaller, faster, and less expensive components.
The
IMOS technology has the potential to enter and dominate markets
such as CD/DVD systems, magneto-optical disk drives, and optical
tracking for floppy disks.
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Development Objectives Defined for IMOS
The ATP-funded project for IMOS development simulated and designed
IMOS devices using integrated software modules for optical, mechanical,
thermal, and electromagnetic
analysis. The development objectives for the IMOS devices were fabrication
at the wafer level and then integration and testing. The project focused
primarily on infrastructure development while maintaining alignment
with photonics industry requirements. |
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