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Technical Reports

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Division Overview
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Thermophysical Properties of Gases Used in Semiconductor Processing
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Models and Data for Semiconductor Processing
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Surface Temperature Measurements
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Standards for Low Concentrations of Water Vapor in Gases
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Measurements and Models for Plasma Processing of Semiconductors
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Development of Quantitative Measurements for Vacuum Process Control
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Calibration and Test Services Provided by the Process Measurements Division
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Standards for Raman Spectroscopy
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Development of Optical Methods for Chemical Sensing
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Maintenance and Dissemination of the International Temperature Scale of 1990 (ITS-90)
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Thermodynamic Temperature Measurements
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Atomic Standard of Pressure
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Accurate Measurements of the Dielectric Constants with Toroidal Cross Capacitors
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New Primary Pressure Standard
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Recent Developments in National Flow Standards
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Tele-Calibrations and Advanced Ultrasonic Flow Metering
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Application of Micro-Electro-Mechanical System (MEMS) Ultrasonic Transducer for Flow Metering
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Gas Sensing with Microhotplate Sensor Arrays
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Self-Assembled Monolayers for Diagnostics and Sensing
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Measurement Technology for Benchmark Spray Combustion Data
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Microfluidic Measurement Technology
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The BIPM/CIPM Working Group for Fluid Flow (WGFF)
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International Comparisons of Temperature Standards and Scale Realization