Staff
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Scientific
Staff
Uli Dahmen
(510) 486-4627
Ulrich Dahmen is Director of the National Center for Electron Microscopy. His current research interests include embedded nanostructures and interfaces in materials.
Embedded nanostructures. Size- and shape-dependence of structural phase transformations in solids. Orientation relationships, crystallographic symmetry, shapes and the role of defects in precipitation reactions and thin film growth. Electron microscopy characterization of morphology and interface structure by conventional, in-situ, high resolution and diffraction techniques and correlation with property measurements and computer image simulations.
Ulrich Dahmen obtained his Ph.D. in materials science from UC Berkeley in 1979, then joined Berkeley Lab in a postdoctoral position, and subsequently was named principal investigator and senior staff scientist. Since 1993, he has been head of the National Center for Electron Microscopy at Lawrence Berkeley National Laboratory. He also directs a research program on the crystallography of microstructures that uses transmission electron microscopy as a major tool for microstructural characterization. He has published extensively on the atomic structure of interfaces, phase transformations, the evolution of precipitate morphologies and the effects of size on the behavior of embedded particles. His activities on behalf of the materials and microscopy community include service on the editorial advisory board of several scientific journals, a term as director of physical sciences in the Microscopy Society of America, organization of numerous symposia at national and international meetings and the current scientific direction of the TEAM microscopy effort for the Department of Energy.
Christian Kisielowski
(510) 486-4716
High resolution electron microscopy and its application to materials sciences. Development of robust, fast and quantitative techniques and methods to extend resolution to below 0.1 nm such as QUANTITEM or electron holography. Atomic structure of buried interfaces and boundaries in subsurface systems made from semiconductors or ceramics. Mapping of local compositional changes, local strain and local electromagnetic fields. Development and application of advanced high resolution electron beam tomography and techniques for aberration-corrected microscopy.
Dr. Christian Kisielowski is Staff Scientist and Principle Investigator at the National Center for Electron Microscopy (NCEM), Lawrence Berkeley National Laboratory, Berkeley CA 94720. He was awarded his PhD in natural sciences and his Habilitation in physics performing spectroscopic studies on defects in semiconductors at the University of Cologne / Germany in 1985 and 1990. Thereafter, he joined AT&T Bell Laboratories (1991 – 1994) where he established a new quantitative method for image analyses in High Resolution Electron Microscopy (QUANTITEM). From 1994 through 1997 he lead research efforts to develop GaN thin film growth by Molecular Beam Epitaxy at the University of California in Berkeley. Since 1997 he is Staff Scientist at the NCEM and responsible for the development and application of High Resolution Electron Microscopy. He was the first to demonstrate sub-Ångstrom resolution by phase contrast microscopy and has published over 150 articles concerning a large variety of materials with focus on semiconductors. Currently, his research interests include the implementation of the next generation electron microscopes (TEAM Project) and the development of electron tomography with atomic resolution.
Rolf Erni
Rolf Erni’s research focuses on the development and improvement of atomic-resolution imaging and analyses techniques in state-of-the-art (scanning) transmission electron microscopy. His activities include materials science applications employing aberration-corrected imaging in STEM and TEM and spatially resolved high-energy resolution (low-loss) electron energy-loss spectroscopy carried out on monochromated microscopes. The experimental work is complemented with basic theoretical approaches based on image simulations and calculations of inelastic electron scattering.
Rolf received his doctorate from the Swiss Federal Institute of Technology (ETH Zurich, Switzerland) in 2003. He joined the University of California Davis and the National Center for Electron Microscopy (NCEM) in a postdoctoral position in 2003. From 2004 until 2006, he worked for FEI Company in Eindhoven (NL) as a senior system engineer involved in the development of a dedicated aberration-corrected (scanning) transmission electron microscope platform (FEI Titan 80-300 instruments). Thereafter, he was affiliated with the EMAT research group, University of Antwerp (Belgium), in an assistant professor position. Since 2007 Rolf is term staff scientist at NCEM and involved in the implementation of the TEAM microscopes at NCEM.
(510) 486-4721
Andrew Minor (Andy)
(510) 495-2749
Andrew Minor’s research focuses on developing and applying sample preparation methods for high resolution, analytical and in-situ electron microscopy, with the goal of overcoming current limitations in resolution, accuracy and detectability posed by the TEM sample itself. Application of focused ion beam instrumentation to nanoscale structures or devices for specific research projects in transmission electron microscopy. Development of new techniques and instrumentation such as nanoindentation, microscopy of soft matter and TEAM.
Experimental techniques to investigate size effects at small scales, nanoscale fabrication methods, and novel sample manipulation and preparation methods for electron microscopy investigations. These methods include silicon-based and focused ion micromachining of small structures, as well as advanced electron microscopy-based materials characterization of both organic and inorganic materials.
Dr Minor is in charge of the in situ and sample preparation effort at NCEM, including the FEI dual-beam Focused Ion Beam (FIB) and JEOL 3010 in situ TEM. He is also the scientific staff member in charge of the field emission SEM and sample preparation laboratories, and assists in and coordinates NCEM user instruction and research at these facilities. Dr. Minor received his Ph.D in Materials Science and Engineering from the University of California, Berkeley, in 2002.
Velimir Radmilovic
(510) 486-5663
Structure-property relationships in engineering materials. Solid state phase transformations and interfaces. Alloy design for structural applications. Electron microscopy characterization of materials by conventional, high resolution, and diffraction techniques supported by computer image simulations.
Quentin Ramasse
(510) 486-4721
Quentin Ramasse’s research interests comprise both methodological and practical aspects of aberration corrected scanning transmission electron microscopy (STEM). He focuses on the development of advanced operation and analysis techniques through imaging and wave-optical theory, and developed for instance an aberration diagnosis method for purely crystalline samples. His instrumentation development activities are also complemented with materials science applications of aberration-corrected STEM, most recently in the domain of alternative energy sources.
Quentin obtained his Ph.D. from the University of Cambridge before joining NCEM as a post-doctoral fellow in 2005 to set up and oversee the operation of a Nion-corrected VG HB501 scanning transmission electron microscope, the centre’s first aberration corrected instrument. He is now a term staff scientist.
Andreas Schmid
(510) 486- 4564
SPLEEM (Spin Polarized Low Energy Electron Microscopy) for the study of surface and thin film magnetic microstructures and their dynamic behavior. In-situ investigations of growth and structure of thin films, effect of environmental factors (sample temperature, deposition flux, applied magnetic fields, etc.). Nanostructure self-assembly at surfaces. Development of new techniques and instrumentation.
Masashi Watanabe
(510) 486- 4634
Masashi's research emphasizes materials characterization using various electron microscopy approaches involving analysis via X-rays and energy-loss electrons in analytical electron microscopes (AEMs) and atomic-resolution high angle annular dark-filed (HAADF) imaging in scanning transmission electron microscopes (STEMs). He developed the z (zeta)-factor method for quantitative X-ray analysis and implemented multivariate statistical analysis for spectrum images of X-rays and energy-loss electrons.
Masashi obtained his Ph.D. in Metallurgy from Kyushu University in 1996 and was a postdoctoral research associate at Lehigh until 1998. He was an associate professor at Research Laboratory for High Voltage Electron Microscopy in Kyushu. Then, Masashi returned to Lehigh University as a Research Scientist in 2001 and was promoted to a Senior Research Scientist in 2004. In March 2007, Masashi joined the scientific staff at NCEM. Masashi received the K.F.J. Heinrich young scientist award from the Microbeam Analysis Society in 2005 and has been a lecturer in the AEM course at the Lehigh Microscopy School since 2001.
Technical and Administrative Staff
Doreen Ah Tye
(510) 486-4324
Specimen Preparation, Phenom
Jane Cavlina
(510) 486-6036
Administrator
Thomas Duden
(510) 486-4634
Zonghoon Lee
(510) 486-4590
CTEM, CM200, Libra
ChengYu Song
(510) 486-6751
CM300 microscope, Specimen Preparation, 3010 insitu microscope
John Turner
(510) 486-5700
Computer Lab, FIB microscope, Photography, Video, Web Page, Building Manager
Postdoctoral Staff and Visitors
Daan Alsem
(510) 495-2455Helmut Poppa
(510) 486-4721
Suhan Kim
(510) 486-4590
Marta Rossell
(510) 486-4590
Farid El Gabaly
(510) 495-2455
Damien Alloyeau
(510) 486-4590
Frances Allen
(510) 486-4618
Tamara Radetic
(510) 486-4110
Jia Ye
(510) 486-4618
Haimei Zheng
(510) 486-4110
Jong Yuk
(510) 495-2455
Bin Xiang
(510) 486-4614